Abstract
Ion implantation consists of a process in which chosen ions are accelerated in vacuum to energies of a few tens or hundreds of keV and injected into the surface layers of a material. By altering the composition, generally of a shallow layer less than a micron in thickness, the surface properties are modified.
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Dearnaley, G. (1980). Micrometallurgy by Ion Implantation. In: Bethge, K., Baumann, H., Jex, H., Rauch, F. (eds) Nuclear Physics Methods in Materials Research. Vieweg+Teubner Verlag. https://doi.org/10.1007/978-3-322-85996-9_4
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DOI: https://doi.org/10.1007/978-3-322-85996-9_4
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