Abstract
An electron beam is rastered across the specimen surface resulting in the generation of secondary and backscattered electrons which are used to form images while x-rays are used to obtain elemental constitution of the specimen material. Present-day technology allows imaging of features as small as 1 nm in the SEM. The predominant use of the SEM is to generate SE and BSE images showing topographic and compositional contrast, respectively. This chapter deals with the mechanism of contrast formation, factors that affect its development, and how its interplay contributes to the appearance of various features observed in the images.
Change history
09 August 2023
A correction has been published.
References
Newbury DE, Myklebust RL (1979) Monte Carlo electron trajectory simulation of beam spreading in thin foil targets. Ultramicroscopy 2(9):391–395
Sim SK, Teh V (2015) Image signal-to-noise ratio estimation using adaptive slope nearest-neighbourhood model. J Microsc 260:352–362. https://doi.org/10.1111/jmi.12302
Frank J, Al-Ali L (1975) Signal-to-noise ratio of electron micrographs obtained by cross correlation. Nature 256:376–379. https://doi.org/10.1038/256376a0
Erasmus J (1982) Reduction of noise in TV rate electron microscope images by digital filtering. J Microsc 127:29–37
Yeap ZX, Sim KS, Tso CP (2016) Signal-to-noise ratio estimation technique for SEM Image using linear regression, Proc. of 2016 international conference on robotics, automation and sciences (ICORAS) 5–6 Nov. 2016. https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=7872602. Date accessed 19 Sept 2018
Thong JT, Sim KS, Phang JC (2001) Single-image signal-to-noise ratio estimation. Scanning 23:328–336. https://doi.org/10.1002/sca.4950230506
Sim KS, Thong JTL, Phang JCH (2006) Effect of shot noise and secondary emission noise in scanning electron microscope images. Scanning 26:36–40. https://doi.org/10.1002/sca.4950260106
Henoc J, Maurice F (1991) In: Heinrich KFJ, Newbury DE (eds) Electron probe quantification. Plenum Press, New York, p 105
Hovington P, Drouin D, Gauvin R (1997) CASINO: A new Monte Carlo code in C language for electron beam interaction - Part I: Description of the program. Scanning 19(1):1–14
Kanaya K, Okayama S (1972) Penetration and energy-loss theory of electrons in solid targets. J Phys D 5:43
Reimer L (1998) Scanning electron microscopy: physics of image formation and microanalysis, 2nd edn. Springer, Heidelberg
Reuter W (1972) In Proc. 6th international congress on X-ray optics and microanalysis, Shinoda G, Kohra K, and Ichinokawa T (ed), University of Tokyo Press, Tokyo, p. 121
Heinrich KFJ (1966) In Proc. 4th international conference on X-ray optics and microanalysis, Castaing R, Deschamps P, and Philibert J (eds.), Hermann, Paris, p. 159
Goldstein JI, Newbury DE, Joy DC, Lyman C, Echlin P, Lifshin E, Sawyer L, Micheal JR (2003) Scanning electron microscopy and X-Ray microanalysis, 3rd edn. Springer, New York
Invitation to the SEM World JEOL Ltd. Publication, Tokyo, Japan. https://wiki.nbi.ku.dk/w/cleanroom/images/b/b5/Invitation_to_the_SEM_World.pdf. Date accessed 19 Sept 2018
Joy DC (1998) Scanning electron microscopy. In: Amelinckx S, van Dyck D, van Landuyt J, van Tendeloo G (eds) Handbook of microscopy-applications. VCH, Weinheim
Ball MD, Wilson M, Whitmarsh S (1987) In: Brown LM (ed) Electron microscopy and microanalysis 1987. Institute of Physics, London, p 185
Tixier J, Philibert R (1969) Effets de contraste cristallin en microscopie électronique à balayage. Micron (1):174
Seiler H (1967) Einige aktuelle Probleme der Sekundarelektron-emission. Z Phys 22:249–263
Koshikawa T, Shimizu R (1974) A Monte Carlo calculation of low-energy secondary electron emission from metal. J Phys D Appl Phys 7:1303
Drescher H, Reimer L, Seidel H (1970) Rückstreukoeffizient und Sekundärelektronen-Ausbeute von 10–100 keV-Elektronen und Beziehungen zur Raster-Elektronenmikroskopie. Z Agnew, Phys 29:331–336
Loretto MH (1984) Electron beam analysis of materials. Chapman and Hall, London
Reimer L, Tollkamp C (1980) Measuring the backscattering coefficient and secondary electron yield inside a scanning electron microscope. Scanning 3(1):35–39
Joy DC (1987) A model for calculating secondary and backscattered electron yields. J Microsc 147(1):51–64
Vaz OW, Krause SJ (1986) In Proc. EMSA Conference Bailey GW (ed), San Francisco Press, San Francisco, p. 676
Wittry DB (1966) Proc: 4th international conference on X-ray optics and microanalysis, Castaing R, Deschamps P, Philibert J (eds) Hermann, Paris, p. 168
Kanter H (1961) Energy dissipation and secondary electron emission in solids. Phys Rev 121(3):677–681
Bozolla JJ (1999) Electron microscopy, principles and techniques for biologists, 2nd edn. Jones and Bartlett Publishers, Burlington
Author information
Authors and Affiliations
Rights and permissions
Copyright information
© 2018 Springer Nature Switzerland AG
About this chapter
Cite this chapter
Ul-Hamid, A. (2018). Contrast Formation in the SEM. In: A Beginners' Guide to Scanning Electron Microscopy. Springer, Cham. https://doi.org/10.1007/978-3-319-98482-7_3
Download citation
DOI: https://doi.org/10.1007/978-3-319-98482-7_3
Published:
Publisher Name: Springer, Cham
Print ISBN: 978-3-319-98481-0
Online ISBN: 978-3-319-98482-7
eBook Packages: Chemistry and Materials ScienceChemistry and Material Science (R0)