Investigation on the Variation of Sheet Resistance of RF Deposited Nichrome Thin Films with Deposition Parameters
Nichrome thin films were deposited by Radio Frequency (RF) magnetron sputtering with variable RF power and argon gas pressure at room temperature. It was found that the sheet resistance (Rsh) varied with different deposition parameters. Energy Dispersive Spectroscopy (EDS) results show that the composition of deposited films were same. Scanning Electron Microscopy (SEM) characterization reveals the formation of clusters with variable size during the deposition which may be contributing to the change in the sheet resistance of the films.
KeywordsNiCr RF sputtering Sheet resistance Cluster boundary
- 2.E. Schippel, Exp. Tech. Phys. (Berlin) 24, 361 (1976)Google Scholar