Abstract
Laser beams are powerful tools for diagnostic purposes and growth of thin films . However, the interaction of lasers with organic or biological materials may result in laser-induced photo-chemical and photo-thermal damage to the materials of interest. In order to reduce these effects, the matrix-assisted pulsed laser evaporation (MAPLE) technique was introduced for thin film deposition with the possibility to use two different wavelength ranges to induce target ablation: laser absorption by the matrix (UV-MAPLE) or direct laser excitation of vibrational frequency of the matrix constituent bonds (RIR-MAPLE) . In this chapter, the UV-MAPLE physical working principles will be outlined together with its applications and latest results. The RIR-MAPLE working principle and applications to materials of interest for optoelectronics applications will be described and discussed also, with particular attention to the emulsion -based RIR-MAPLE approach relating the film properties with the physical-chemical properties of the emulsion components (primary and secondary solvent , surfactant and matrix ).
Keywords
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- 1.
Conformal coverage is achieved when a film of uniform thickness precisely follows the geometry of the underlying substrate.
- 2.
The natural limit of the applicability of the model are defined by the conditions for the onset of multiphoton absorption, photochemical fragmentation, ionization and plasma formation.
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Caricato, A.P., Ge, W., Stiff-Roberts, A.D. (2018). UV- and RIR-MAPLE: Fundamentals and Applications. In: Ossi, P. (eds) Advances in the Application of Lasers in Materials Science. Springer Series in Materials Science, vol 274. Springer, Cham. https://doi.org/10.1007/978-3-319-96845-2_10
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