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Application of NO Laser-Induced Fluorescence in JF-10 Detonation-Driven Shock Tunnel

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31st International Symposium on Shock Waves 1 (ISSW 2017)

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Abstract

We have presented our recent progress in the application of γ(0,0) band NO LIF in the hypersonic flow with total enthalpy of 16.2 MJ/kg generated by JF-10, a H2/O2-detonation-driven shock tunnel. The strong luminosity behind the shock wave is competing against the fluorescence signal, and the photon collecting efficiency of such facilities is limited by its large dimension. To cope with the problems, the laser sheet of a conventional planar LIF is rotated 90° along its propagation direction, so that the fluorescence signal collected by the camera concentrates on a sharp line. This setup makes LIF signal stand out even after the shock wave. With this setup, the S/N ratio is also increased; thus single-shot measurement is achievable. In this paper, the rotational temperature of the flow is estimated based on two-line thermometry.

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Authors and Affiliations

  1. State Key Laboratory of High Temperature Gas Dynamics, Institute of Mechanics, Chinese Academy of Sciences, Beijing, China

    H. Yan, S. Zhang & X. Yu

  2. School of Engineering Science, University of Chinese Academy of Sciences, Beijing, China

    H. Yan & X. Yu

Authors
  1. H. Yan
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  2. S. Zhang
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  3. X. Yu
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Corresponding author

Correspondence to X. Yu .

Editor information

Editors and Affiliations

  1. Department of Aerospace Engineering, Nagoya University, Nagoya, Japan

    Akihiro Sasoh

  2. Department of Energy and Environmental Engineering, Kyushu University, Kasuga, Fukuoka, Japan

    Toshiyuki Aoki

  3. Institute of Innovative Research, Tokyo Institute of Technology, Tokyo, Japan

    Masahide Katayama

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Yan, H., Zhang, S., Yu, X. (2019). Application of NO Laser-Induced Fluorescence in JF-10 Detonation-Driven Shock Tunnel. In: Sasoh, A., Aoki, T., Katayama, M. (eds) 31st International Symposium on Shock Waves 1. ISSW 2017. Springer, Cham. https://doi.org/10.1007/978-3-319-91020-8_42

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  • DOI: https://doi.org/10.1007/978-3-319-91020-8_42

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  • Publisher Name: Springer, Cham

  • Print ISBN: 978-3-319-91019-2

  • Online ISBN: 978-3-319-91020-8

  • eBook Packages: EngineeringEngineering (R0)

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