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Characterization of Thin Organic Films with Surface-Sensitive FTIR Spectroscopy

  • Katy Roodenko
  • Damien Aureau
  • Florent Yang
  • Peter Thissen
  • Jörg Rappich
Chapter
Part of the Springer Series in Surface Sciences book series (SSSUR, volume 52)

Abstract

This chapter reviews the role of infrared spectroscopy in characterization of surfaces and interfaces of thin organic films. FTIR spectroscopy is widely utilized in studies of chemical bonds addressing questions concerning organization and orientation of the molecules in those films. In-situ FTIR spectroscopy frequently aids in studies of chemical reactions under a variety of experimental conditions, from high vacuum to aqueous solutions. FTIR spectroscopy can be realized in a multitude of setup geometries sensitive to a small amount of surface adsorbates. Anisotropic film properties can be studied by incorporating polarizing optics in an FTIR setup. FTIR modes of operation discussed in this chapter are Attenuated Total Reflection (ATR), transmission and reflection of the IR radiation through (or from) the sample, Polarization Modulation Infrared Reflection Absorption Spectroscopy (PM-IRRAS) and Infrared Spectroscopic Ellipsometry (IRSE). Practical considerations related to the sample properties (such as doping or roughness) and to the measurement conditions are discussed.

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Copyright information

© Springer International Publishing AG, part of Springer Nature 2018

Authors and Affiliations

  • Katy Roodenko
    • 1
  • Damien Aureau
    • 2
  • Florent Yang
    • 3
  • Peter Thissen
    • 4
  • Jörg Rappich
    • 5
  1. 1.Department of Materials Science and Engineering, Laboratory for Surface and Nanostructure ModificationUniversity of Texas at DallasRichardsonUSA
  2. 2.Inst. Lavoisier, CNRS, UMR 8180University of Versailles St Quentin YvelinesVersaillesFrance
  3. 3.Institute for Heterogeneous Material SystemsHelmholtz-Zentrum Berlin für Materialien und Energie GmbHBerlinGermany
  4. 4.Institute of Functional Interfaces (IFG), Karlsruhe Institute of Technology (KIT)Eggenstein-LeopoldshafenGermany
  5. 5.Inst. für Si-PhotovoltaikHelmholtz-Zentrum Berlin für Materialien und Energie GmbHBerlinGermany

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