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Standing-Wave and Resonant Soft- and Hard-X-ray Photoelectron Spectroscopy of Oxide Interfaces

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Spectroscopy of Complex Oxide Interfaces

Part of the book series: Springer Series in Materials Science ((SSMATERIALS,volume 266))

Abstract

We discuss several new directions in photoemission that permit more quantitatively studying buried interfaces: going to higher energies in the multi-keV regime; using standing-wave excitation, created by reflection from either a multilayer heterostructure or atomic planes; tuning the photon energy to specific points near absorption resonances; and making use of near-total-reflection geometries. Applications to a variety of oxide and spintronic systems are discussed.

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Acknowledgements

The specific sources of funding for the various studies presented here are listed in the publications cited. Beyond this, C.S.F. has also been supported during the writing of this chapter for salary by the Director, Office of Science, Office of Basic Energy Sciences (BSE), Materials Sciences and Engineering (MSE) Division, of the U.S. Department of Energy under Contract No. DE-AC02-05CH11231, through the Laboratory Directed Research and Development Program of Lawrence Berkeley National Laboratory, and through a DOE BES MSE grant at the University of California Davis from the X-ray Scattering Program under Contract DE-SC0014697. A.X.G acknowledges support during the writing of this chapter from the U.S. Army Research Office, under Grant No. W911NF-15-1-0181.

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Authors and Affiliations

  1. Peter-Grünberg-Institut PGI-6, Forschungszentrum Jülich GmbH, 52425, Jülich, Germany

    Slavomír Nemšák

  2. Department of Physics, Temple University, Philadelphia, PA, 19122, USA

    Alexander X. Gray

  3. Department of Physics, University of California Davis, Davis, CA, 95616, USA

    Charles S. Fadley

  4. Lawrence Berkeley National Laboratory, Materials Sciences Division, Berkeley, CA, 94720, USA

    Charles S. Fadley

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  1. Slavomír Nemšák
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  2. Alexander X. Gray
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  3. Charles S. Fadley
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Correspondence to Slavomír Nemšák .

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Editors and Affiliations

  1. Empa—Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, Switzerland

    Claudia Cancellieri

  2. Spectroscopy of Novel Materials Group, Paul Scherrer Institute, Villigen, Switzerland

    Vladimir N. Strocov

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Nemšák, S., Gray, A.X., Fadley, C.S. (2018). Standing-Wave and Resonant Soft- and Hard-X-ray Photoelectron Spectroscopy of Oxide Interfaces. In: Cancellieri, C., Strocov, V. (eds) Spectroscopy of Complex Oxide Interfaces. Springer Series in Materials Science, vol 266. Springer, Cham. https://doi.org/10.1007/978-3-319-74989-1_7

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