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Fictitious Particle Approach for Light Scattering Investigation from the Line Features of a Substrate Based on the Discrete Sources Method

  • Yuri Eremin
  • Thomas WriedtEmail author
Chapter
  • 467 Downloads
Part of the Springer Series on Atomic, Optical, and Plasma Physics book series (SSAOPP, volume 99)

Abstract

Computer simulation of light scattering from features on plane interfaces is of interest in the semiconductor and nanoelectronic industry. Submicrometer defects on silicon substrates are detected and characterized by in-line laser scanning surface inspection systems. A reliable computer model for predicting this light scattering would provide a flexible and efficient tool for efficient surface features detection and discrimination. Based on the Discrete Sources Method (DSM) a new fictitious particle concept has been elaborated and realized. Based on this conception an updated DSM computer model enables to analyze light scattering from line defects of a plane silicon substrate such as a line bump and a pit. Computer simulation results corresponding to the Scattering Cross-Section (SCS) for P/S polarized excitation are presented. It was found that the Total Scattering Cross-Section (TSC) can be change by an order of magnitude depending on the orientation of the linear feature with respect to the plane wave incident direction.

Keywords

Discrete Source Method (DSM) Fictitious Particle Line Bump Total Scat Tering Cross Section (TSC) Reliable Computer Model 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

Notes

Acknowledgements

We gratefully acknowledge funding of this research by Deutsche Forschungsgemeinschaft (DFG) and Russian Foundation for Basic Research (RFBR).

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Copyright information

© Springer International Publishing AG, part of Springer Nature 2018

Authors and Affiliations

  1. 1.Lomonosov Moscow State UniversityMoscowRussia
  2. 2.Leibniz-Institut für Werkstofforientierte Technologien—IWTBremenGermany

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