Abstract
Hydrophobic surfaces of silicon nitride atomic force microscopy (AFM) probes and silicon wafers (used as AFM samples) were prepared by silanization with octadecyltrichlorosilane (OTS, C18H37SiCl3) molecules. The silanization process included plasma cleaning and hydroxylation of silicon nitride or silicon surfaces and self assembled monolayer deposition of OTS molecules. The surface forces between OTS functionalized AFM tip and sample surfaces in deionized water were determined by AFM force spectroscopy measurements. The measurements indicated a repulsive double layers force caused by electrical charging of OTS surface in water at neutral pH and an attractive hydrophobic force. The distance range and magnitude of attractive hydrophobic force showed a large variability due to presence of conglomerates of polymerized OTS molecules on the OTS modified surface of silicon wafers.
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Acknowledgement
This work was supported by CNCSIS, IDEI Research Program of Romanian Research, Development and Integration National Plan II, Grant no. 267/2011.
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Besleaga, A., Samoila, F., Sirghi, L. (2018). Surface Forces Between Hydrophobic Surfaces Obtained by Self-assembled Monolayers Deposition of Octadecyltrichlorosilane. In: Luca, D., Sirghi, L., Costin, C. (eds) Recent Advances in Technology Research and Education. INTER-ACADEMIA 2017. Advances in Intelligent Systems and Computing, vol 660. Springer, Cham. https://doi.org/10.1007/978-3-319-67459-9_18
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DOI: https://doi.org/10.1007/978-3-319-67459-9_18
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