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Book cover Growth of High Permittivity Dielectrics by High Pressure Sputtering from Metallic Targets

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Abstract

The integrated circuits (ICs) based on complementary metal-oxide-semiconductor (CMOS) devices are currently the dominant technology in the microelectronic industry. Its success is based on the low static power consumption and its high integration density.

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  1. Department of Física Aplicada III: Electricidad y Electrónica, Facultad de Ciencias Físicas, The Complutense University of Madrid, Madrid, Spain

    María Ángela Pampillón Arce

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Pampillón Arce, M.Á. (2017). Introduction. In: Growth of High Permittivity Dielectrics by High Pressure Sputtering from Metallic Targets. Springer Theses. Springer, Cham. https://doi.org/10.1007/978-3-319-66607-5_1

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