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Effect of Bromide Ions on the Pitting Corrosion of Hafnium in Anhydrous t-Butanol and Acetonitrile

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Characterization of Minerals, Metals, and Materials 2017

Part of the book series: The Minerals, Metals & Materials Series ((MMMS))

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Abstract

Pitting of Hf in Et4NBr t-butanol and acetonitrile (ACN) solutions was studied by means of cyclic voltammetry, potentiodynamic anodic polarization , galvanostatic, potentiostatic and impedance techniques. The potentiodynamic anodic polarization curves did not exhibit an active dissolution region near corrosion potential due to the presence of an oxide film on the electrode surface, which was followed by pitting corrosion resulting from the passivity breakdown by the aggressive attack of bromide (Br−) ion. The pitting potential (E pit) increased with increasing potential scanning rate but decreased with increasing temperature and Br− concentration. Cyclic voltammetry and galvanostatic measurements allowed the pitting potential (E pit) and the repassivation potential (E p) to be determined. Analysis of the potential/time transients revealed that the applied anodic current density had a significant influence on the values of E pit. On the other hand, the E p values were independent on the applied current density. The current/time transients indicated that the incubation time (t i) for passivity breakdown decreased slightly with increasing potential and solution temperature. The impedance spectra showed that the resistance of passive layer decreased with increasing potential.

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References

  1. Turevskaya EP et al (1995) The alkoxides of zirconium and hafnium: direct electrochemical synthesis and mass-spectral study. Do “M(OR)4”, where M=Zr, Hf, Sn, really exist. Russ Chem Bull 44(4):734–742

    Article  Google Scholar 

  2. Bohr MT et al (2007) The high-k solution. IEEE Spectr 44:29–35

    Article  Google Scholar 

  3. Usui T et al (2013) Approaching limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition. Acta Mater 61(20):1–11

    Article  Google Scholar 

  4. Karmakov I et al (2009) Spectroscopic ellipsometry of very thin tantalum pentoxide on Si. Appl Surf Sci 255:9211–9216

    Article  Google Scholar 

  5. Zhang F et al (2015) Solution-processed hafnium oxide dielectric thin films for thin-film transistors applications. Ceram Int 41:13218–13223

    Article  Google Scholar 

  6. Hildebrandt EM (2012) Oxygen engineered hafnium oxide thin films grown by reactive molecular beam epitaxy, pp 11–17

    Google Scholar 

  7. Bradley DC et al (2001) Alkoxo and aryloxo derivatives of metals. Academic Press, San Diego

    Google Scholar 

  8. Shreider VA et al (1981) Direct electrochemical synthesis of metal alkoxides. Inorg Chim Acta 53:73–76

    Article  Google Scholar 

  9. Yang SH et al (2008) Preparation of high-purity tantalum ethoxide by vacuum distillation. Trans Nonferrous Met Soc China 18(1):196–201

    Article  Google Scholar 

  10. Yang SH et al (2009) Electrochemical synthesis and characterization of tantalum alkoxides. Trans Nonferrous Met Soc China 19(6):1504–1508

    Article  Google Scholar 

  11. Cai YN et al (2011) Electrochemical synthesis, characterization and thermal properties of niobium ethoxide. J Cent South Univ Technol 18:73–77

    Article  Google Scholar 

  12. Wang CH et al (2015) Effect of bromide ions on the corrosion behavior of hafnium in anhydrous ethanol. RSC Adv 5:34580–34587

    Article  Google Scholar 

  13. Davydov AD (2001) Breakdown of valve metal passivity induced by aggressive anions. Electrochim Acta 46(24):3777–3781

    Article  Google Scholar 

  14. Kaesche H (1988) Microtunnelling during selective alloy dissolution and during pitting. Mater Corros 39(4):153–161

    Article  Google Scholar 

  15. Muñoz AG, Bessone JB (1999) Pitting of aluminium in non-aqueous chloride media. Corros Sci 4(41):1447–1463

    Article  Google Scholar 

  16. Szklarska-Smialowska Z (1986) Pitting corrosion of metals. Electrochem Soc Interface 19(1):33–38

    Google Scholar 

  17. Hassan HH, Fahmy K (2008) Pitting corrosion of tin by acetate anion in acidic media. Int J Electrochem Sci 3(1):29–43

    Google Scholar 

  18. Duc HD, Tissot P (1979) Anodic behaviour of tin in neutral phosphate solution. Corros Sci 19(3):179–190

    Article  Google Scholar 

  19. Szklarska-Smialowska Z (1986) Pitting corrosion of metals. Electrochem Soc Interface 19(1):33–38

    Google Scholar 

  20. Brett CMA (1992) On the electrochemical behaviour of aluminium in acidic chloride solution. Corros Sci 33(2):203–210

    Article  Google Scholar 

Download references

Acknowledgements

We are grateful to the Natural Science Foundation of China (No. 51374254) for providing financial support.

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Authors and Affiliations

  1. School of Metallurgy and Environment, Central South University, Changsha, 410083, China

    Wang Changhong, Yang Shenghai, Chen Yongming, Yang Xiyun, Wu Yanzeng, He Jing & Tang Chaobo

Authors
  1. Wang Changhong
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  2. Yang Shenghai
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  3. Chen Yongming
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  4. Yang Xiyun
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  5. Wu Yanzeng
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  6. He Jing
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  7. Tang Chaobo
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Corresponding author

Correspondence to Yang Shenghai .

Editor information

Editors and Affiliations

  1. Al Isra University , Amman, Jordan

    Shadia Ikhmayies

  2. Michigan Technological University, Houghton, Michigan, USA

    Bowen Li

  3. Los Alamos National Laboratory, Los Alamos, New Mexico, USA

    John S. Carpenter

  4. Canmet Materials , Hamilton, Ontario, Canada

    JIan Li

  5. Michigan Technological University, Houghton, Michigan, USA

    Jiann-Yang Hwang

  6. Military Institute of Engineering, IME, Rio De Janeiro, Brazil

    Sergio Neves Monteiro

  7. Poltecnico di Torino , Turin, Italy

    Donato Firrao

  8. ArcelorMittal Global R&D, East Chicago, Indiana, USA

    Mingming Zhang

  9. Central South University , Changsha, China

    Zhiwei Peng

  10. University of New South Wales , Canberra, Australia

    Juan P. Escobedo-Diaz

  11. Chongqing University , Chongqing, China

    Chenguang Bai

  12. Middle East Technical University , Ankara, Turkey

    Yunus Eren Kalay

  13. Naval Research Laboratory , Washington, District of Columbia, USA

    Ramasis Goswami

  14. Korea Railroad Research Institute, Uiwang, Korea (Republic of)

    Jeongguk Kim

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© 2017 The Minerals, Metals & Materials Society

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Changhong, W. et al. (2017). Effect of Bromide Ions on the Pitting Corrosion of Hafnium in Anhydrous t-Butanol and Acetonitrile. In: Ikhmayies, S., et al. Characterization of Minerals, Metals, and Materials 2017. The Minerals, Metals & Materials Series. Springer, Cham. https://doi.org/10.1007/978-3-319-51382-9_38

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