Abstract
This work presents a simple and easy method of surface cleaning of silica substrates used for thin film depositions and preparation of microscopy samples. To this purpose, we use a surface dielectric barrier discharge (SDBD) in flow of dried air (relative humidity below 2 %) at atmospheric pressure. The silica substrates and SDBD electrodes were mounted face to face with a small gap (2 mm) through which was flown the working gas. The cleaning effectiveness was evaluated by measurements of water contact angle of the silica surfaces, which showed a decrease from 60° to >30° in 20 min of treatment.
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References
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Acknowledgments
This work was supported by CNCSIS, IDEI Research Program of Romanian Research, Development and Integration National Plan II, Grant no. 267/2011.
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Sirghi, L., Samoila, F., Anita, V. (2017). Cleaning of Silica Surfaces by Surface Dielectric Barrier Discharge Plasma. In: Jabłoński, R., Szewczyk, R. (eds) Recent Global Research and Education: Technological Challenges. Advances in Intelligent Systems and Computing, vol 519. Springer, Cham. https://doi.org/10.1007/978-3-319-46490-9_35
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DOI: https://doi.org/10.1007/978-3-319-46490-9_35
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