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Excited Intermediates in Silanes Combustion

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Key Factors of Combustion

Part of the book series: Springer Aerospace Technology ((SAT))

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Abstract

It is shown that the flame emission in the region 400–600 nm in monosilane and dichlorosilane oxidation (initial pressures of 3–20 Torr; T0 = 300 K) is caused by radical luminescence processes on the surface of aerosol ultra-disperse particles of SiO2. The generation of energy by the interaction of gas-phase species with the SiO2 surface at initial stages of the phase formation depends on the presence of both the intrinsic structural defects =Si: and defects of Si+ implanted into SiO2. The addition of SF6 to the initial mixture results in the appearance of the emission bands due to the Si+ defects in the radical luminescence spectrum. Electronically excited HO2 radicals (A 1 A′–X 2 A′′), OH radicals (ν = 2-0), and HCl molecules (ν = 3-0) are identified using the emission spectra at 0.8–1.6 μm in the rarefied flame in dichlorosilane combustion at 293 K and low pressures. The spectrum also contains the composite bands of the H2O (0.823 μm) and H2O2 (0.854 μm) molecule vibrations. The maximum intensity of emission of these species is reached behind the front of the chemical transformation, and the equilibrium between the vibrational and translational degrees of freedom is established in the region of the regular thermal regime of cooling. SF6 additives act as a reservoir that accumulates the vibrational energy in the developed ignition.

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  1. Institute of Structural Macrokinetics and Material Science, Russian Academy of Sciences, Moscow, Russia

    Nikolai M. Rubtsov

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Rubtsov, N.M. (2017). Excited Intermediates in Silanes Combustion. In: Key Factors of Combustion. Springer Aerospace Technology. Springer, Cham. https://doi.org/10.1007/978-3-319-45997-4_4

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  • DOI: https://doi.org/10.1007/978-3-319-45997-4_4

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