Abstract
The chapter presents a classification scheme which covers the theory and practice of boriding processes and their interconnection and allows to determine the areas of practical use for obtained boronized layers. The mechanism of atom formation includes the initial state of boron, the state of saturating medium, the formation conditions of saturating atoms and the means for their formation and transportation to the processed surface. The technological peculiarities involve the methods and ways, types of heating and processing specifics. The thermal interval of boriding processes is divided into high-temperature, medium-temperature and low-temperature boriding; it also reflects the possibilities of combining boriding with other processes of thermal treatment and processing of different details and tools. The analysis of phase composition covers the type of borderline and hardness of obtained layers of different morphology. All the technical terms are properly defined.
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Notes
- 1.
Sub-compounds—compounds occurring in non-equilibrium thermo-dynamical conditions. They are formed by low valent ions of boron (sub-ions). For oxohalide systems it can be BO, BCl, BCl2, BF, BF2 which form ad-atoms and/or boron ad-ions on the processed surface due to the reactions of disproportioning.
References
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Krukovich, M.G., Prusakov, B.A., Sizov, I.G. (2016). General Classification of Boriding Processes. In: Plasticity of Boronized Layers. Springer Series in Materials Science, vol 237. Springer, Cham. https://doi.org/10.1007/978-3-319-40012-9_2
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DOI: https://doi.org/10.1007/978-3-319-40012-9_2
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