Fabrication Process and Techniques for Integrated Devices and Waveguide Materials

Abstract

This chapter is aimed at presenting an interesting picture of the state of the art in waveguide fabrication processes and techniques, providing standpoint of what can be expected in the near future. This chapter also summarizes an inclusive study on fabrication process and available techniques for the realization of the integrated optic waveguide devices. Although many material systems are projected for the fabrication of integrated optic devices, the field of silicon photonics fabrication platform is gaining momentous impetus. It permits optical devices to get finished very economically using standard semiconductor fabrication techniques and incorporated with microelectronic chips. Usually, the fabricated devices are made out of semiconductor materials, dielectrics, oxides, and metals. In this chapter, an in-depth study on silicon-based materials and its fabrication technology is conferred in detail for waveguide application. A brief analysis has been carried out on different waveguide materials and their contemporary advantages along with the limitations. Based on highly sophisticated fabrication technology, it is found that silicon photonics fabrication platform would afford us with an inexpensive vastly integrated electronic–photonic platform in which ultra-compact photonic devices can be made. Finally, this chapter ends with an overall discussion on basic steps of fabrication and examples that indicate the usefulness of silicon oxynitride as the waveguide material for high-density integrated optics.