Epitaxial TiO2 Thin Films on Single Crystal Substrates
This chapter describes the deposition of thin films of TiO2 on single crystal substrates by pulsed laser deposition (PLD). The aim was to grow epitaxial films with different orientations and hence with different facets at the surface. This would allow the characteristics of each crystallographic face to be studied independently, for example, the adsorption of molecules or the photo-electrochemical performance. In particular, the low index (001) and (100) surfaces of anatase were of interest.
KeywordsPole Figure TiO2 Film Full Width Half Maximum Strained Layer High Oxygen Pressure
- 1.Silva, V.F., et al.: Substrate-controlled allotropic phases and growth orientation of TiO2 epitaxial thin films. J. Appl. Cryst. 43, 1502–1512 1–11 (2010). doi: 10.1107/S0021889810041221