Advertisement

Epitaxial TiO2 Thin Films on Single Crystal Substrates

  • John Callum AlexanderEmail author
Chapter
Part of the Springer Theses book series (Springer Theses)

Abstract

This chapter describes the deposition of thin films of TiO2 on single crystal substrates by pulsed laser deposition (PLD). The aim was to grow epitaxial films with different orientations and hence with different facets at the surface. This would allow the characteristics of each crystallographic face to be studied independently, for example, the adsorption of molecules or the photo-electrochemical performance. In particular, the low index (001) and (100) surfaces of anatase were of interest.

Keywords

Pole Figure TiO2 Film Full Width Half Maximum Strained Layer High Oxygen Pressure 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

References

  1. 1.
    Silva, V.F., et al.: Substrate-controlled allotropic phases and growth orientation of TiO2 epitaxial thin films. J. Appl. Cryst. 43, 1502–1512 1–11 (2010). doi: 10.1107/S0021889810041221
  2. 2.
    Swanepoel, R.: Determination of the thickness and optical-constants of amorphous-silicon. J. Phys. E: Sci. Instrum. 16, 1214–1222 (1983)CrossRefGoogle Scholar
  3. 3.
    Diebold, U.: The surface science of titanium dioxide. Surf. Sci. Rep. 48, 53–229 (2003)CrossRefGoogle Scholar
  4. 4.
    Yan, J., et al.: Understanding the effect of surface/bulk defects on the photocatalytic activity of TiO2: anatase versus rutile. Phys. Chem. Chem. Phys. 15, 10978 (2013)CrossRefGoogle Scholar

Copyright information

© Springer International Publishing Switzerland 2016

Authors and Affiliations

  1. 1.Imperial College LondonLondonUK

Personalised recommendations