Abstract
This chapter details an investigation of the growth of TiO2 films on fused silica. The initial motivation to use an amorphous glass substrate was to reproduce anatase films with the (101) orientation as seen by other groups working on TiO2 for use as a transparent conductive oxide [1].
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Notes
- 1.
See http://www.camglassblowing.co.uk/gproperties.htm for range of properties of glasses.
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Alexander, J.C. (2016). TiO2 Thin Films on Fused Silica. In: Surface Modifications and Growth of Titanium Dioxide for Photo-Electrochemical Water Splitting. Springer Theses. Springer, Cham. https://doi.org/10.1007/978-3-319-34229-0_7
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