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TiO2 Thin Films on Fused Silica

  • John Callum AlexanderEmail author
Chapter
Part of the Springer Theses book series (Springer Theses)

Abstract

This chapter details an investigation of the growth of TiO2 films on fused silica. The initial motivation to use an amorphous glass substrate was to reproduce anatase films with the (101) orientation as seen by other groups working on TiO2 for use as a transparent conductive oxide [1].

Keywords

Fuse Silica Oxygen Pressure TiO2 Film Anatase Phase Substrate Heating 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Springer International Publishing Switzerland 2016

Authors and Affiliations

  1. 1.Imperial College LondonLondonUK

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