Abstract
As an important component of polluted air, NO x not only pollutes the atmospheric environment, but also causes harm to the health of humans directly or indirectly. Thus, different routes, such as selective catalytic reduction, selective non-catalytic reduction, and photocatalytic technologies have been explored for removing NO x . Among them, the photocatalytic route obtained lots of attentions due to its preferred advantages, including simple operation, low cost, high efficiency, and strong durability. In this chapter, we briefly introduce the generation mechanism, properties, and the hazards of NO x , comparing the different techniques for NO x degradation. We mainly focus on the photocatalytic NO x removal by reviewing the latest development of advanced nanoarchitectures for oxidation of NO x via designing and fabricating novel photocatalytic semiconductor nanomaterials, of which TiO2-based photocatalysts, bismuth-based photocatalysts and their modifications are discussed.
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Acknowledgements
This work was supported by the National Natural Science Foundation of China (NSFC 21477079, 21207090, 21237003, 21261140333), PCSIRT (IRT1269), Shanghai Government (14JC1402500, 11SG42, 15QA1403300h), the Doctoral Program of Higher Education (20123127120009), and Shanghai Normal University (DXL122 and S30406).
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Xiao, S., Zhang, D., Li, G., Li, H. (2016). Development of Advanced Nanoarchitectures for Photocatalytic Treatment of NO x . In: Yamashita, H., Li, H. (eds) Nanostructured Photocatalysts. Nanostructure Science and Technology. Springer, Cham. https://doi.org/10.1007/978-3-319-26079-2_5
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