Abstract
This chapter provides a broad overview of the sources of airborne contamination that may occur in buildings designed for advanced technology instruments and fabrication facilities. International standards for classifying levels of cleanliness of the air in these spaces in terms of particle size and particle concentration are briefly described. This is followed by an overview of cleanroom design principles and the filtering systems employed to achieve the various standards of air cleanliness in the cleanrooms.
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Notes
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High Efficiency Particulate Air filter, http://en.wikipedia.org/wiki/HEPA
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Ultra Low Particulate Air filter; http://en.wikipedia.org/wiki/ULPA
Bibliography
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C. Muller, Chapter 41: Airborne molecular contamination, in Semiconductor Manufacturing Handbook, ed. by H. Geng (McGraw Hill, New York, 2005). ISBN 0-07-144559-5
R.V. Pavlotsky, S.C. Beck, Chapter 38: Cleanroom design and construction, in Semiconductor Manufacturing Handbook, ed. by H. Geng (McGraw Hill, New York, 2005). ISBN 0-07-144559-5
M. Ramstorp, Introduction to Contamination Control and Cleanroom Technology (Wiley, Weinham, 2000). ISBN 3-527-30142-9
W. Whyte, Cleanroom Technology: Fundamentals of Design, Testing and Operation (Wiley, Chichester, 2001). ISBN 0-471-86842-6
Acknowledgement
Thanks to Mark Jamison who synthesized material from several sources into the initial draft.
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© 2015 Springer International Publishing Switzerland
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Soueid, A., Teague, E.C., Murday, J. (2015). Airborne Contamination. In: Soueid, A., Teague, E., Murday, J. (eds) Buildings for Advanced Technology. Science Policy Reports. Springer, Cham. https://doi.org/10.1007/978-3-319-24892-9_9
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DOI: https://doi.org/10.1007/978-3-319-24892-9_9
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