Abstract
This chapter provides an overview of the coating and functionalization of nanostructured substrates and high surface area materials using vapor phase deposition techniques. The main thin film growth techniques, types of substrates, and the fundamental concepts involving the reactive transport inside nanostructures are introduced. Finally, we provide a short historical overview focusing on key application domains, including semiconductor processing, chemical vapor infiltration, and catalysis.
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References
L. Niinisto, J. Paivasaari, J. Niinisto, M. Putkonen, M. Nieminen, Phys. Status Solidi A 201(7), 1443 (2004)
M. Knez, K. Niesch, L. Niinisto, Adv. Mater. 19(21), 3425 (2007)
F. Zaera, Chem. Soc. Rev. 42(7), 2746 (2013)
A. Stein, B.E. Wilson, S.G. Rudisill, Chem. Soc. Rev. 42(7), 2763 (2013)
C. Marichy, M. Bechelany, N. Pinna, Adv. Mater. 24(8), 1017 (2012)
M.E. Donders, J.F.M. Oudenhoven, L. Baggetto, H.C.M. Knoops, M.C.M. van de Sanden, W.M.M. Kessels, P.H.L. Notten, in Atomic Layer Deposition Applications 6, ECS Transactions, vol. 33 (2010), pp. 213–222
Y.S. Jung, A.S. Cavanagh, L.A. Riley, S.H. Kang, A.C. Dillon, M.D. Groner, S.M. George, S.H. Lee, Adv. Mater. 22, 2172 (2010)
V. Meille, Appl. Catal. A-Gen. 315, 1 (2006)
A.E. Kaloyeros, E. Eisenbraun, Ann. Rev. Mater. Sci. 30, 363 (2000)
D.P. Stinton, A.J. Caputo, R.A. Lowden, Am. Ceram. Soc. Bull. 65(2), 347 (1986)
H. Nishimura, S. Takagi, M. Fujino, N. Nishi, Jpn. J. Appl. Phys. Part 1-Regul. Pap. Short Notes Rev. Pap. 41, 2886 (2002)
H. Miguez, E. Chomski, F. Garcia-Santamaria, M. Ibisate, S. John, C. Lopez, F. Meseguer, J.P. Mondia, G.A. Ozin, O. Toader, H.M. van Driel, Adv. Mater. 13, 1634 (2001)
K.B. Lee, S.M. Lee, J. Cheon, Adv. Mater. 13(7), 517 (2001)
I.A. Blech, Thin Solid Film. 6, 113 (1970)
S. Hamaguchi, S.M. Rossnagel, J. Vac. Sci. Technol. B 14, 2603 (1996)
K.A. Arpin, M.D. Losego, A.N. Cloud, H.L. Ning, J. Mallek, N.P. Sergeant, L.X. Zhu, Z.F. Yu, B. Kalanyan, G.N. Parsons, G.S. Girolami, J.R. Abelson, S.H. Fan, P.V. Braun, Nat. Commun. 4, 2630 (2013)
N. Kumar, A. Yanguas-Gil, S.R. Daly, G.S. Girolami, J.R. Abelson, J. Am. Chem. Soc. 130(52), 17660 (2008)
J.W. Elam, J.A. Libera, M.J. Pellin, A.V. Zinovev, J.P. Greene, J.A. Nolen, Appl. Phys. Lett. 89(5), 053124 (2006)
H.C.M. Knoops, E. Langereis, M.C.M. van de Sanden, W.M.M. Kessels, J. Electrochem. Soc. 157(12), G241 (2010)
J.G. Ryan, R.M. Geffken, N.R. Poulin, J.R. Paraszczak, IBM J. Res. Dev. 39(4), 371 (1995)
M. Nandakumar, A. Chatterjee, S. Sridhar, K. Joyner, M. Rodder, I.C. Chen, in International Electron Devices Meeting 1998. Technical Digest (Cat. No.98CH36217) (1998), pp. 133–136
S.P. Murarka, Mater. Sci. Eng. R-Rep. 19(3–4), 87 (1997)
Y. Chen, R. Schneider, S.Y. Wang, R.S. Kern, C.H. Chen, C.P. Kuo, Appl. Phys. Lett. 75(14), 2062 (1999)
C.I.H. Ashby, C.C. Mitchell, J. Han, N.A. Missert, P.P. Provencio, D.M. Follstaedt, G.M. Peake, L. Griego, Appl. Phys. Lett. 77(20), 3233 (2000)
J.W. Elam, D. Routkevitch, P.P. Mardilovich, S.M. George, Chem. Mater. 15(18), 3507 (2003)
A.B.F. Martinson, J.W. Elam, J. Liu, M.J. Pellin, T.J. Marks, J.T. Hupp, Nano Lett. 8(9), 2862 (2008)
A.U. Mane, Q. Peng, J.W. Elam, D.C. Bennis, C.A. Craven, M.A. Detarando, J.R. Escolas, H.J. Frisch, S.J. Jokela, J. McPhate, M.J. Minot, O.H. Siegmund, J.M. Renaud, R.G. Wagner, M.J. Wetstein, Phys. Proc. 37, 722 (2012)
D.J. Comstock, S.T. Christensen, J.W. Elam, M.J. Pellin, M.C. Hersam, Adv. Funct. Mater. 20(18), 3099 (2010)
A.B.F. Martinson, J.W. Elam, J.T. Hupp, M.J. Pellin, Nano Lett. 7(8), 2183 (2007)
D. Routkevitch, A.A. Tager, J. Haruyama, D. Almawlawi, M. Moskovits, J.M. Xu, IEEE Trans. Electron Dev. 43(10), 1646 (1996)
H. Chik, J. Liang, S.G. Cloutier, N. Kouklin, J.M. Xu, Appl. Phys. Lett. 84(17), 3376 (2004)
Y. Li, G.T. Duan, G.Q. Liu, W.P. Cai, Chem. Soc. Rev. 42(8), 3614 (2013)
J.G. Fleming, S.Y. Lin, I. El-Kady, R. Biswas, K.M. Ho, Nature 417(6884), 52 (2002)
A. Rugge, J.S. Becker, R.G. Gordon, S.H. Tolbert, Nano Lett. 3, 1293 (2003)
D. Hisamoto, W.C. Lee, J. Kedzierski, H. Takeuchi, K. Asano, C. Kuo, E. Anderson, T.J. King, J. Bokor, C.M. Hu, IEEE Trans. Electron Dev. 47(12), 2320 (2000)
Z.X. Yang, Y.D. Xia, R. Mokaya, J. Am. Chem. Soc. 129(6), 1673 (2007)
H. Vuori, R.J. Silvennoinen, M. Lindblad, H. Osterholm, A.O.I. Krause, Catal. Lett. 131(1–2), 7 (2009)
S. Hermes, M.K. Schroter, R. Schmid, L. Khodeir, M. Muhler, A. Tissler, R.W. Fischer, R.A. Fischer, Angew. Chem. Int. Ed. 44(38), 6237 (2005)
J.E. Mondloch, W. Bury, D. Fairen-Jimenez, S. Kwon, E.J. DeMarco, M.H. Weston, A.A. Sarjeant, S.T. Nguyen, P.C. Stair, R.Q. Snurr, O.K. Farha, J.T. Hupp, J. Am. Chem. Soc. 135(28), 10294 (2013)
L.A. Riley, S. Van Ana, A.S. Cavanagh, Y.F. Yan, S.M. George, P. Liu, A.C. Dillon, S.H. Lee, J. Power Sources 196(6), 3317 (2011)
H. Feng, J.W. Elam, J.A. Libera, W. Setthapun, P.C. Stair, Chem. Mater. 22, 3133 (2010)
B.M. Klahr, T.W. Hamann, J. Phys. Chem. C 113(31), 14040 (2009)
Q.F. Zhang, C.S. Dandeneau, X.Y. Zhou, G.Z. Cao, Adv. Mater. 21(41), 4087 (2009)
M.T. Mayer, C. Du, D.W. Wang, J. Am. Chem. Soc. 134(30), 12406 (2012)
X.B. Meng, K. He, D. Su, X.F. Zhang, C.J. Sun, Y. Ren, H.H. Wang, W. Weng, L. Trahey, C.P. Canlas, J.W. Elam, Adv. Funct. Mater. 24(34), 5435 (2014)
G.K. Hyde, K.J. Park, S.M. Stewart, J.P. Hinestroza, G.N. Parsons, Langmuir 23(19), 9844 (2007)
J.S. Jur, W.J. Sweet, C.J. Oldham, G.N. Parsons, Adv. Funct. Mater. 21(11), 1993 (2011)
G.N. Parsons, S.M. George, M. Knez, MRS Bull. 36(11), 865 (2011)
Q. Peng, Y.C. Tseng, S.B. Darling, J.W. Elam, ACS Nano 5(6), 4600 (2011)
Q. Peng, Y.C. Tseng, S.B. Darling, J.W. Elam, Adv. Mater. 22(45), 5129 (2010)
W. Steckelmacher, Rep. Prog. Phys. 49(10), 1083 (1986)
J.L. Vossen, G.L. Schnable, W. Kern, J. Vac. Sci. Technol. 11(1), 60 (1974)
P.J. Ireland, Thin Solid Film. 304, 1 (1997)
M. Koyanagi, H. Sunami, N. Hashimoto, M. Ashikawa, in Electron Devices Meeting, 1978 International, vol. 24, pp. 348–351 (1978)
I. Golecki, Mater. Sci. Eng. R-Rep. 20(2), 37 (1997)
R. Naslain, F. Langlais, R. Fedou, J. Phys. 50(C-5), 191 (1989)
S. Middleman, J. Mater. Res. 4(6), 1515 (1989)
E.W. Thiele, Ind. Eng. Chem. 31, 916 (1939)
R.J. Peglar, F.H. Hambleto, J.A. Hockey, J. Catal. 20(3), 309 (1971)
D.J.C. Yates, G.W. Dembinsk, W.R. Kroll, J.J. Elliott, J. Phys. Chem. 73(4), 911 (1969)
S. Sato, H. Sakurai, K. Urabe, Y. Izumi, Chem. Lett. 14(3), 277 (1985)
S. Haukka, E.L. Lakomaa, O. Jylha, J. Vilhunen, S. Hornytzkyj, Langmuir 9(12), 3497 (1993)
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Yanguas-Gil, A. (2017). Introduction. In: Growth and Transport in Nanostructured Materials. SpringerBriefs in Materials. Springer, Cham. https://doi.org/10.1007/978-3-319-24672-7_1
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