Abstract
In order to control the temperature on the wafer in a rapid thermal processing system, we develop a reduced model of the dynamic based on the spectrum of the system operator and then develop a sliding mode controller for the system. The dominant modes of the system are extracted through the analysis of the spectrum. Galerkin’s method is utilized to construct the reduced model of the system with the dominant modes as the trial functions. Then, sliding mode controller is designed based on the reduced model. Simulations are performed by comparing the high-order model with the proposed reduced model and applying the control scheme to the system. Simulation results show that the proposed reduced model has relatively small order but the same ability to model the process and the sliding mode control actions can heat the wafer to a desired temperature with a uniform distribution.
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References
Surridge, R.K., Sealy, B.J.: Comparison of sn-ion-implanted, ge-ion-implanted, se-ion-implanted and te-ion-implanted gaas. Journal of Physics D-Applied Physics 10, 911–917 (1977)
Sedgwick, T.O.: Short-time annealing. Journal of the Electrochemical Society 130, 484–493 (1983)
Singh, R.: Rapid isothermal processing. Journal of Applied Physics 63, R59–R114 (1988)
Coaton, J.R., Fitzpatrick, J.R.: Tungsten-halogen lamps and regenerative mechanisms. IEE Proceedings-A-Science Measurement and Technology 127, 142–148 (1980)
Rehmet, M.: Xenon lamps. IEE Proceedings-A-Science Measurement and Technology 127, 190–195 (1980)
Walsh, P.J., Kermani, A.: Electrical characterization of cw xenon arcs at moderate currents. Journal of Applied Physics 61, 4484–4491 (1987)
Gelpey, J.C., Stump, P.O.: Rapid annealing using the water-wall arc lamp. Nuclear Instruments and Methods in Physics Research Section B-Beam Interactions with Materials and Atoms 6, 316–320 (1985)
Lee, C.H., Chizinsky, G.: Rapid thermal-processing using a continuous heat-source. Solid State Technology 32, 43–44 (1989)
Kim, K.B., Maillot, P., Morgan, A.E., Kermani, A., Ku, Y.H.: Formation of beta-sic at the interface between an epitaxial si layer grown by rapid thermal chemical vapor-deposition and a si substrate. Journal of Applied Physics 67, 2176–2179 (1990)
Fulcher, M.R., Kwor, R., Ricker, R.E., Ho, C.C., Gelpey, J.C.: Tem study of rapid thermal annealed sb-implanted si. Journal of the Electrochemical Society 330, C329–C330 (1986)
Sheets, R.E.: Automatic cassette to cassette radiant impulse processor. Nuclear Instruments and Methods in Physics Research Section B-Beam Interactions with Materials and Atoms 6, 219–223 (1985)
Chatterjee, S., Trachtenberg, I., Edgar, T.F.: Mathematical-modeling of a single-wafer rapid thermal reactor. Journal of the Electrochemical Society 139, 3682–3689 (1992)
Lord, H.A.: Thermal and stress analysis of semiconductor wafers in a rapid thermal processing oven. IEEE Transactions on Semiconductor Manufacturing 1, 105–114 (1988)
Kakoschke, R., Bussmann, E., Foll, H.: Modeling of wafer heating during rapid thermal-processing. Applied Physics A-Materials Science and Processing 50, 141–150 (1990)
Cho, W., Edgar, T.F., Lee, J.: Nonlinear model identification for temperature control in single wafer rapid thermal processing. Industrial and Engineering Chemistry Research 47, 4791–4796 (2008)
Kakoschek, R., BuMann, E.: Simulation of temperature effects during rapid thermal processing. In: MRS Proceedings Symposium B Rapid Thermal Annealing/Chemical Vapor Deposition and Integrated Processing (1989)
Banerjee, S., Cole, J.V., Jensen, K.F.: Designing reduced-order models for rapid thermal processing systems. Journal of the Electrochemical Society 145, 3974–3981 (1998)
Banerjee, S., Cole, J.V., Jensen, K.F.: Nonlinear model reduction strategies for rapid thermal processing systems. IEEE Transactions on Semiconductor Manufacturing 11, 266–275 (1998)
Theodoropoulou, A., Adomaitis, R.A., Zafiriou, E.: Model reduction for optimization of rapid thermal chemical vapor deposition systems. IEEE Transactions on Semiconductor Manufacturing 11, 85–98 (1998)
Kakoschek, R., BuMann, E.: Simulation of temperature effects during rapid thermal processing. In: MRS Proceedings Symposium B Rapid Thermal Annealing/Chemical Vapor Deposition And Integrated Processing (1989)
Vandenabeele, P., Maex, K., De Keersmaecker, R.: Impact of patterned layers on temperature non-uniformity during rapid thermal processing for vlsi-applications. In: MRS Proceedings Symposium B Rapid Thermal Annealing/Chemical Vapor Deposition and Integrated Processing (1989)
Hill, C., Jones, S., Boys, D.: Rapid thermal annealing - theory and practice. In: Levy, R. (ed.) Reduced Thermal Processing For ULSI, Springer, US (1989)
Dassau, E., Grosman, B.: Lewin DaR Modeling and temperature control of rapid thermal processing. Computers and Chemical Engineering 30, 686–697 (2006)
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Xiao, T., Li, HX. (2015). Model Reduction for Sliding Mode Control of Rapid Thermal Processing System. In: Yu, X., Önder Efe, M. (eds) Recent Advances in Sliding Modes: From Control to Intelligent Mechatronics. Studies in Systems, Decision and Control, vol 24. Springer, Cham. https://doi.org/10.1007/978-3-319-18290-2_19
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DOI: https://doi.org/10.1007/978-3-319-18290-2_19
Publisher Name: Springer, Cham
Print ISBN: 978-3-319-18289-6
Online ISBN: 978-3-319-18290-2
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