Abstract
The atomic force microscope (AFM) operated in the noncontact mode (nc-AFM) offers a unique tool for real space, atomic-scale characterisation of point defects and molecules on surfaces, irrespective of the substrate being electrically conducting or non-conducting. The nc-AFM has therefore in recent years become an important tool for fundamental analysis of defects at the atomic scale on metal oxide systems. Here the principles of the nc-AFM technique are presented and I review the recent interplay between atom-resolved nc-AFM experiments and atomistic nc-AFM simulations of the predominant defects on the rutile TiO2(110) surface. The present Chapter continues the review of nc-AFM initiated in Chap. 7 by Barth.
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Acknowledgments
The author is grateful to all members of the SPM-UHV and nanocatalysis groups at Interdisciplinary Nanoscience Center (iNANO) at Aarhus University. Support from the European Research Foundation (ERC Grant no. 239834) is acknowledged. Adam Foster, Stefan Wendt, Ruben Perez, Ayhan Yurtsever and Ralf Bechstein are all thanked for sharing the original files for the presented figures.
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Lauritsen, J.V. (2015). Noncontact AFM Imaging of Atomic Defects on the Rutile TiO2(110) Surface. In: Jupille, J., Thornton, G. (eds) Defects at Oxide Surfaces. Springer Series in Surface Sciences, vol 58. Springer, Cham. https://doi.org/10.1007/978-3-319-14367-5_8
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