Abstract
Resistive switching in oxides, the phenomenon whereby the resistance of samples of the matrix can be cycled between states with contrasts of up to several orders of magnitude, has received growing attention over the past decade thanks to the possibility of exploiting this effect in novel memory technologies. Here we summarise the current state of the art in the field, paying particular attention to the underlying mechanisms of switching, which involves the creation of defects in the oxide. We also describe potential technological applications.
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References
D.R. Lamb, P.C. Rundle, A non-filamentary switching action in thermally grown silicon dioxide films. Br. J. Appl. Phys. 18, 29 (1967)
C.M. Osburn, D.W. Ormond, Dielectric breakdown in silicon dioxide films on silicon.1. Measurement and interpretation. J. Electrochem. Soc. 119, 591 (1972)
A.D. Pearson, C.E. Miller, Filamentary conduction in semiconducting glass diodes. Appl. Phys. Lett. 14, 280 (1969)
S.R. Ovshinski, E.J. Evans, D.L. Nelson, H. Fritzsch, Radiation hardness of ovonic devices. IEEE Trans. Nucl. Sci. NS 15, 311 (1968)
S.R. Ovshinsky, Reversible electrical switching phenomena in disordered structures. Phys. Rev. Lett. 21, 1450 (1968)
A.T. Waterman, On the positive ionization from certain hot salts, together with some observations on the electrical properties of molybdenite at high temperatures. Phil. Mag. 33, 225 (1917)
G.W. Burr, M.J. Breitwisch, M. Franceschini, D. Garetto, K. Gopalakrishnan, B. Jackson, B. Kurdi, C. Lam, L.A. Lastras, A. Padilla, B. Rajendran, S. Raoux, S. Shenoy, Phase change memory technology. J. Vac. Sci. Technol. B 28, 223 (2010)
H.-S.P. Wong, S. Raoux, S.B. Kim, J. Liang, J.P. Reifenberg, B. Rajendran, M. Asheghi, K.E. Goodson, Phase change memory. Proc. IEEE 98, 2201 (2010)
R. Waser, R. Bruchhaus, S. Menzel, in Nanoelectronics and Information Technology, 3rd edn, ed. by R. Waser (Wiley-VCH, Weinheim, 2012)
T. Hickmott, Low-frequency negative resistance in thin anodic oxide films. J. Appl. Phys. 33, 2669 (1962)
C.A. Mead, Operation of tunnel-emission devices. J. Appl. Phys. 32, 646 (1961)
E.L. Cook, Model for resistive-conductive transition in reversible resistance-switching solids. J. Appl. Phys. 41, 551 (1970)
H. Pagnia, N. Sotnik, Bistable switching in electroformed metal-insulator-metal devices. Phys. Status Solidi A 108, 11 (1988)
Y. Watanabe, J.G. Bednorz, A. Bietsch, Ch. Gerber, D. Widmer, A. Beck, S.J. Wind, Current-driven insulator-conductor transition and nonvolatile memory in chromium-doped SrTiO3 single crystals. Appl. Phys. Lett. 78, 3738 (2001)
J.R. Contreras, H. Kohlstedt, U. Poppe, R. Waser, C. Buchal, N.A. Pertsev, Resistive switching in metal-ferroelectric-metal junctions. Appl. Phys. Lett. 83, 4595 (2003)
S. Tsui, A. Baikalov, J. Cmaidalka, Y.Y. Sun, Y.Q. Wang, Y.Y. Yue, C.W. Chu, L. Chen, A.J. Jacobson, Field-induced resistive switching in metal-oxide interfaces. Appl. Phys. Lett. 85, 317 (2004)
S. Seo, M.J. Lee, D.H. Seo, E.J. Jeoung, D.S. Suh, Y.S. Joung, I.K. Yoo, I.R. Hwang, S.H. Kim, I.S. Byun, J.S. Kim, J.S. Choi, B.H. Park, Reproducible resistance switching in polycrystalline NiO films. Appl. Phys. Lett. 85, 5655 (2004)
A. Sawa, T. Fujii, M. Kawasaki, Y. Tokura, Hysteretic current-voltage characteristics and resistance switching at a rectifying Ti/Pr0.7Ca0.3MnO3 interface. Appl. Phys. Lett. 85, 4073 (2004)
A. Chen, S. Haddad, Y.C. Wu, T.N. Fang, Z. Lan, S. Avanzino, S. Pangrle, M. Buynoski, M. Rathor, W.D. Cai, N. Tripsas, C. Bill, M. VanBuskirk, M. Taguchi, Non-volatile resistive switching for advanced memory applications, in IEEE International Electron Devices, Technical Digest (2005), p. 765
M. Kund, G. Beitel, C.U. Pinnow, T. Rohr, J. Schumann, R. Symanczyk, K.D. Ufert, G. Muller, Conductive bridging RAM (CBRAM): an emerging non-volatile memory technology scalable to sub 20 nm. in IEEE International Electron Devices, Technical Digest (2005), p. 773
R. Waser, M. Aono, Nanoionics-based resistive switching memories. Nat. Mater. 6, 833 (2007)
D.S. Jeong, R. Thomas, R.S. Katiyar, J.F. Scott, H. Kohlstedt, A. Petraru, C.S. Hwang, Emerging memories: resistive switching mechanisms and current status. Rep. Prog. Phys. 75, 076502 (2012)
J. Hutchby, M. Garner, Assessment of the Potential and Maturity of Selected Emerging Research Memory Technologies Workshop and ERD/ERM Working Group Meeting (2010). www.itrs.net/Links/2010ITRS/2010Update/ToPost/ERD_ERM_2010FINALReportMemoryAssessment_ITRS.pdf
D.B. Strukov, G.S. Snider, D.R. Stewart, R.S. Williams, The missing memristor found. Nature 453, 80 (2008)
O. Kavehei, A. Iqbal, Y.S. Kim, K. Eshraghian, S.F. Al-Sarawi, D. Abbott, The fourth element: characteristics, modelling and electromagnetic theory of the memristor. Proc. Roy. Soc A 466, 2175 (2010)
C. Schindler, S.C.P. Thermadam, R. Waser, M.N. Kozicki, Bipolar and unipolar resistive switching in Cu-doped SiO2. IEEE Trans. Electron Dev. 54, 2762 (2007)
D.S. Jeong, H. Schroeder, R. Waser, Coexistence of bipolar and unipolar resistive switching behaviors in a Pt/TiO2/Pt stack. Electrochem. Solid State Lett. 10, G51 (2007)
E. Linn, R. Rosezin, C. Kugeler, R. Waser, Complementary resistive switches for passive nanocrossbar memories. Nat. Mater. 9, 403 (2010)
M.-J. Lee, C.B. Lee, D. Lee, S.R. Lee, M. Chang, J.H. Hur, Y.-B. Kim, C.-J. Kim, D.H. Seo, S. Seo, U.-I. Chung, I.-K. Yoo, K. Kim, A fast, high-endurance and scalable non-volatile memory device made from asymmetric Ta2O5–x/TaO2–x bilayer structures. Nat. Mater. 10, 625 (2011)
F. Nardi, S. Balatti, S. Larentis, D. Ielmini, Complementary switching in metal oxides: toward diode-less crossbar RRAMs. IEDM Tech. Dig. 31(1), 1 (2011)
Y. Yang, P. Sheridan, W. Lu, Complementary resistive switching in tantalum oxide-based resistive memory devices. Appl. Phys. Lett. 100, 203112 (2012)
F. Nardi, S. Balatti, S. Larentis, D. Ielmini, Complementary switching in oxide-based bipolar resistive-switching random memory. IEEE Trans. Electron Dev. 60, 70 (2013)
S. Balatti, S. Larentis, D.C. Gilmer, D. Ielmini, Multiple memory states in resistive switching devices through controlled size and orientation of the conductive filament. Adv. Mater. 25, 1474 (2013)
J.J. Yang, F. Miao, M.D. Pickett, D.A.A. Ohlberg, D.R. Stewart, C.N. Lau, R.S. Williams, The mechanism of electroforming of metal oxide memristive switches. Nanotechnology 20, 215201 (2009)
R. Münstermann, J.J. Yang, J.P. Strachan, G. Medeiros-Ribeiro, R. Dittmann, R. Waser, Morphological and electrical changes in TiO2 memristive devices induced by electroforming and switching. Phys. Stat. Solidi RRL 4, 16 (2010)
S.H. Jo, K.-H. Kim, W. Lu, Programmable resistance switching in nanoscale two-terminal devices. Nanoletters 9, 496 (2009)
K. Tsunoda, Y. Fukuzumi, J.R. Jameson, Z. Wang, P.B. Griffin, Y. Nishi, Bipolar resistive switching in polycrystalline TiO2 films. Appl. Phys. Lett. 90, 113501 (2007)
P.J. Zhang, Y. Meng, Z.Y. Liu, X.Y. Pan, X.J. Liang, D.M. Chen, H.W. Zhao, Influences of dislocation distribution on the resistive switching effect of Ag-SiO2 thin films. Acta Phys. Sin. 61, 107703 (2012)
S.M. Wu, T. Tsuruoka, K. Terabe, T. Hasegawa, J.P. Hill, K. Ariga, M. Aono, A polymer-electrolyte-based atomic switch. Adv. Funct. Mater. 21, 93 (2011)
K.-C. Chang, T.-M. Tsai, T.-C. Chang, H.-H. Wu, J.-H. Chen, Y.-E. Syu, G.-W. Chang, T.-J. Chu, G.-R. Liu, Y.-T. Su, M.-C. Chen, J.-H. Pan, J.-Y. Chen, C.-W. Tung, H.-C. Huang, Y.-H. Tai, D.S. Gan, S.M. Sze, Characteristics and mechanisms of silicon-oxide-based resistance random access memory. IEEE Electron Dev. Lett. 34, 399 (2013)
J. Yao, Z.Z. Sun, L. Zhong, D. Natelson, J.M. Tour, Resistive switches and memories from silicon oxide. Nano Lett. 10, 4105 (2010)
A. Mehonic, S. Cueff, M. Wojdak, S. Hudziak, O. Jambois, C. Labbe, B. Garrido, R. Rizk, A.J. Kenyon, Resistive switching in silicon suboxide films. J. Appl. Phys. 111, 074507 (2012)
L. Chua, Memristor—missing circuit element. IEEE Trans. Circuit Theory 18, 507 (1971)
T. Prodromakis, C. Toumazou, L. Chua, Two centuries of memristors. Nat. Mater. 11, 478 (2012)
L. Chua, Resistance switching memories are memristors. Appl. Phys. A 102, 765 (2011)
S. Tappertzhofen, S. Schmelzer, J. van den Hurk, F. Lentz, I. Valov, E. Linn, R. Waser, Nanobatteries in redox-based resistive switches require extension of memristor theory. Nat. Commun. 4, 1771 (2013)
S. Thakoor, A. Moopenn, T. Daud, A.P. Thakoor, Solid-state thin-film memistor for electronic neural networks. J. Appl. Phys. 67, 3132 (1990)
N.K. Patel, L. Martinmoreno, M. Pepper, R. Newbury, J.E.F. Frost, D.A. Ritchie, G.A.C. Jones, J. Janssen, J. Singleton, J. Perenboom, Ballistic transport in one dimension—additional quantization produced by an electric-field. J. Phys.: Condens. Matter 2, 7247 (1990)
N.K. Patel, J.T. Nicholls, L. Martinmoreno, M. Pepper, J.E.F. Frost, D.A. Ritchie, G.A.C. Jones, Evolution of half plateaux as a function of electric-field in a ballistic quasi-one dimensional constriction. Phys. Rev. B 44, 13549 (1991)
L. Martinmoreno, J.T. Nicholls, N.K. Patel, M. Pepper, Nonlinear conductance of a saddle-point constriction. J. Phys.: Condens. Matter 4, 1323 (1992)
Z.M. Liao, C. Hou, Q. Zhao, D.S. Wang, Y.D. Li, D.P. Yu, Resistive switching and metallic-filament formation in Ag2S nanowire transistors. Small 5, 2377 (2009)
S. Tappertzhofen, I. Valov, R. Waser, Quantum conductance and switching kinetics of AgI-based microcrossbar cells. Nanotechnology 23, 145703 (2012)
X. Zhu, W. Su, Y. Liu, B. Hu, L. Pan, W. Lu, J. Zhang, R.-W. Li, Observation of conductance quantization in oxide-based resistive switching memory. Adv. Mater. 24, 3941 (2012)
A. Mehonic, A. Vrajitoarea, S. Cueff, S. Hudziak, H. Howe, C. Labbé, R. Rizk, A.J. Kenyon, Quantum conductance in silicon oxide resistive memory devices. Sci. Rep. 3, 2708 (2013)
E. Miranda, S. Kano, C. Dou, K. Kakushima, J. Suñé, H. Iwai, Nonlinear conductance quantization effects in CeOx/SiO2-based resistive switching devices. Appl. Phys. Lett. 101, 012910 (2012)
E. Miranda, J. Su, Mesoscopic approach to the soft breakdown failure mode in ultrathin SiO2 films. Appl. Phys. Lett. 78, 225 (2001)
L.I. Glazman, A.V. Khaetskii, Nonlinear quantum conductance of a lateral microconstraint in a heterostructure. Europhys. Lett. 9, 263 (1989)
X. Xu, Theory of nonlinear ballistic transport in quasi-one-dimensional constrictions. Phys. Rev. B 47, 15630 (1993)
J. Hajto, B. McAuley, A.J. Snell, A.E. Owen, Theory of room temperature quantized resistance effects in metal-a-Si: H-metal thin film structures. J. Non-Cryst. Solids 198, 825 (1996)
E.-J. Yun, M.F. Becker, R.M. Walser, Room temperature conductance quantization in V||amorphous-V2O5||V thin film structures. Appl. Phys. Lett. 63, 2493 (1993)
T. Tsuruoka, T. Hasegawa, K. Terabe, M. Aono, Conductance quantization and synaptic behavior in a Ta2O5-based atomic switch. Nanotechnology 23, 435705 (2012)
K. Terabe, T. Hasegawa, T. Makayama, M. Aono, Quantized conductance atomic switch. Nature 433, 47 (2005)
J.J.T. Wagenaar, M. Morales-Masis, J.M. van Ruitenbeek, Observing “quantized” conductance steps in silver sulfide: Two parallel resistive switching mechanisms. J. Appl. Phys. 111, 014302 (2012)
J.R. Jameson, N. Gilbert, F. Koushan, J. Saenz, J. Wang, S. Hollmer, M. Kozicki, N. Derhacobian, Quantized conductance in Ag/GeS2/W conductive-bridge memory cells. IEEE Electron Dev. Lett. 33, 257 (2012)
S. Long, X.C. Lian, C. Cagli, J. Cortioxà, R. Rurali, E. Miranda, D. Jiménez, L. Perniola, M. Liu, J. Suñé, Quantum-size effects in hafnium-oxide resistive switching. Appl. Phys. Lett. 102, 183505 (2013)
A.C. Torrezan, J.P. Strachan, G. Medeiros-Ribeiro, R.S. Williams, Sub-nanosecond switching of a tantalum oxide memristor. Nanotechnology 22, 485203 (2011)
R. Waser, R. Dittmann, G. Staikov, K. Szot, Redox-based resistive switching memories—nanoionic mechanisms, prospects, and challenges. Adv. Mater. 21, 2632 (2009)
Z. Wei, Y. Kanzawa, K. Arita, Y. Katoh, K. Kawai, S. Muraoka, S. Mitani, S. Fujii, K. Katayama, M. Iijima, T. Mikawa, T. Ninomiya, R. Miyanaga, Y. Kawashima, K. Tsuji, A. Himeno, T. Okada, R. Azuma, K. Shimakawa, H. Sugaya, T. Takagi, R. Yasuhara, K. Horiba, H. Kumigashira, M. Oshima, Highly reliable TaO(x) ReRAM and direct evidence of redox reaction mechanism, in IEEE International Electron Devices Meeting, Technical Digest (2008), p. 293
J.J. Yang, M.-X. Zhang, J.P. Strachan, F. Miao, M.D. Pickett, R.D. Kelley, G. Medeiros-Ribeiro, R.S. Williams, High switching endurance in TaOx memristive devices. Appl. Phys. Lett. 97, 232102 (2010)
J. Shin, J. Park, J. Lee, S. Park, S. Kim, W. Lee, I. Kim, D. Lee, H. Hwang, Effect of program/erase speed on switching uniformity in filament-type RRAM. IEEE Electron Dev. Lett. 32, 958 (2011)
S. Kim, K.P. Biju, M. Jo, S. Jung, J. Park, J. Lee, W. Lee, J. Shin, S. Park, H. Hwang, effect of scaling WOx-based RRAMs on their resistive switching characteristics. IEEE Electron Dev. Lett. 32, 671 (2011)
T. Ninomiya, K. Katayama, S. Muraoka, R. Yusuhara, T. Mikawa, Z. Wei, conductive filament expansion in TaOx bipolar resistive random access memory during pulse cycling. Jap. J. Appl. Phys. 52, 114201 (2013)
A. Mehonic, S. Cueff, M. Wojdak, S. Hudziak, C. Labbé, R. Rizk, A.J. Kenyon, Electrically tailored resistance switching in silicon oxide. Nanotechnology 23, 455201 (2012)
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Mehonic, A., Kenyon, A.J. (2015). Resistive Switching in Oxides. In: Jupille, J., Thornton, G. (eds) Defects at Oxide Surfaces. Springer Series in Surface Sciences, vol 58. Springer, Cham. https://doi.org/10.1007/978-3-319-14367-5_13
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