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Microstructure and Optical Properties of Pure and Cr-Doped TiO2 Thin Films

  • Anouar HajjajiEmail author
  • Mosbah Amlouk
  • Mounir Gaidi
  • Brahim Bessais
  • My Ali El Khakani
Chapter
Part of the SpringerBriefs in Applied Sciences and Technology book series (BRIEFSAPPLSCIENCES)

Abstract

This chapter describes the structural, optical and electrical properties of TiO2 layers grown on various substrates such as quartz, intrinsic silicon and both P and N types silicon. This chapter starts with a brief description of the deposition parameters. In particular, the influence of chromium content as well as the growth and mechanism conditions on the structure, morphology and optical proprieties (size of crystallites, mesh parameter, morphology, chemical composition, optical index, bandgap energy, reflectivity, etc.) of the final prepared films are described.

Keywords

X-ray diffraction (XRD) X-ray photospectroscopy (XPS) X-ray reflectometry Fourier transform infra-red spectroscopy (FTIR) Raman spectroscopy Ellipsometry UV-visible spectroscopy Band gap energy 

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Copyright information

© The Author(s) 2015

Authors and Affiliations

  • Anouar Hajjaji
    • 1
    • 2
    Email author
  • Mosbah Amlouk
    • 3
  • Mounir Gaidi
    • 4
  • Brahim Bessais
    • 2
  • My Ali El Khakani
    • 1
  1. 1.Énergie, Matériaux et TélécommunicationsInstitut National de la Recherche Scientifique (INRS)VarennesCanada
  2. 2.Laboratoire de PhotovoltaïqueCentre de Recherches et des Technologies de l’EnergieHammam-LifTunisia
  3. 3.Unité de Physique des Dispositifs à Semi-Conducteurs, Faculté des Sciences de TunisTunis El-Manar UniversityTunisTunisia
  4. 4.Department of Applied PhysicsUniversity of SharjahSharjahUAE

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