Abstract
Interference lithography has great potential for simple and rapid production of defect-free, large-area periodic nanostructures. In interference lithography, multi-beam interference produces multi-dimensional intensity profile of light in space. The interference-induced intensity profile can be transferred to photosensitive materials in very short exposure times, typically less than 1 sec. More importantly, interference lithography allows for precise control of the feature size and a variety of lattice symmetries through a proper arrangement of laser beams. In this paper, the fabrication of various polymer nanostructures is demonstrated. Also, 2D gold nanohole array is formed by using interference lithography and Ar ion milling process. Finally, 3D titania inverse structures are generated by sol-gel chemistry reaction, which is very attractive for the simplicity and ease of fabrication. We believe that facile and reliable methods for generating metal or semiconductor nanostructured materials can be applied to photonic sensors and optoelectronic devices.
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Park, SG., Kim, DH., Nam, KS., Jeong, Y., Braun, P.V. (2014). Fabrication of Three-Dimensional Nanostructured Materials by Interference Lithography and Inversion Process. In: Udomkichdecha, W., Böllinghaus, T., Manonukul, A., Lexow, J. (eds) Materials Challenges and Testing for Manufacturing, Mobility, Biomedical Applications and Climate. Springer, Cham. https://doi.org/10.1007/978-3-319-11340-1_7
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DOI: https://doi.org/10.1007/978-3-319-11340-1_7
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