Abstract
Plasmas, hot or cold, are sources of radiation. The plasmas being created from low-pressure to atmospheric pressure, in thermodynamic equilibrium or not, emit in a broad region of the electromagnetic spectra, from vacuum ultraviolet to infrared. The emission spectroscopy employed in the analysis of the emitted radiation is a non-intrusive technique with good spatial and temporal resolutions. Emission spectroscopy may be also helpful to determine some plasma parameters as gas temperature, vibrational temperature and fractional composition of the medium for example. With a good optical arrangement, local measurements can be done for these parameters with fast photo-detectors like photomultipliers tubes. Spectroscopic measurements of plasma parameters and species concentrations can be done in real-time, with resolution of some nanoseconds, which allows to follow their evolutions. These properties make the emission spectroscopy a powerful tool to probe, for example, surface treatments by plasma. Another good example of using emission spectroscopy in industry is the end-point detection of some etching reactors, used in microelectronic, helping us in the stop of the etching process.
The original version of this chapter was revised. An erratum to this chapter can be found at DOI 10.1007/978-3-319-09253-9_12
An erratum to this chapter can be found at http://dx.doi.org/10.1007/978-3-319-09253-9_12
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Loureiro, J., Amorim, J. (2016). Emission Spectroscopy. In: Kinetics and Spectroscopy of Low Temperature Plasmas. Graduate Texts in Physics. Springer, Cham. https://doi.org/10.1007/978-3-319-09253-9_8
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DOI: https://doi.org/10.1007/978-3-319-09253-9_8
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