Abstract
Nanoimprint lithography is a high-resolution, high-throughput and low-cost technology to pattern nanostructure, but it only works well on planar surface. To solve this issue, a hybrid nanoimprint-soft Lithography (HNSL) was developed to pattern nanostructures on highly curved surfaces (e.g. the sidewall of an optical fiber). Moreover, double transfer UV-curing nanoimprint lithography, an improved version of HNSL, was introduced to enable high fidelity pattern transfer. Optical fibers can be patterned using this technology, and that opened the door to numerous applications.
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
References
K.O. Hill, Y. Fujii, D.C. Johnson, B.S. Kawasaki, Photosensitivity in optical fiber waveguides: Application to reflection filter fabrication. Appl. Phys. Lett. 32(10), 647–649 (1978)
K.O. Hill, B. Malo, F. Bilodeau, D.C. Johnson, J. Albert, Bragg gratings fabricated in monomode photosensitive optical fiber by UV exposure through a phase mask. Appl. Phys. Lett. 62(10), 1035–1037 (1993)
J. Martin, F. Ouellette, Novel writing technique of long and highly reflective in-fibre gratings. Electron. Lett. 30(10), 811–812 (1994)
J. Albert, S. Theriault, F. Bilodeau, D.C. Johnson, K.O. Hill, P. Sixt, M.J. Rooks, Minimization of phase errors in long fiber Bragg grating phase masks made using electron beam lithography. IEEE Photonics Technol. Lett. 8(10), 1334–1336 (1996)
M.L. von Bibra, A. Roberts, J. Canning, Fabrication of long-period fiber gratings by use of focused ion-beam irradiation. Opt. Lett. 26(11), 765–767 (2001)
S.Y. Chou, P.R. Krauss, P.J. Renstrom, Nanoimprint lithography. J. Vac. Sci. Technol. B 14(6), 4129–4133 (1996)
Z.W. Li, Y.N. Gu, L. Wang, H.X. Ge, W. Wu, Q.F. Xia, C.S. Yuan, Y. Chen, B. Cui, R.S. Williams, Hybrid nanoimprint-soft lithography with sub-15 nm resolution. Nano Lett. 9(6), 2306–2310 (2009)
M.D. Austin, H.X. Ge, W. Wu, M.T. Li, Z.N. Yu, D. Wasserman, S.A. Lyon, S.Y. Chou, Fabrication of 5 nm linewidth and 14 nm pitch features by nanoimprint lithography. Appl. Phys. Lett. 84(26), 5299–5301 (2004)
L.J. Guo, Recent progress in nanoimprint technology and its applications. J. Phys. D-Appl. Phys. 37(11), R123–R141 (2004)
E. Menard, M.A. Meitl, Y. Sun, J.-U. Park, D.J.-L. Shir, Y.-S. Nam, S. Jeon, J.A. Rogers, Micro- and nanopatterning techniques for organic electronic and optoelectronic systems. Chem. Rev. 107(4), 1117–1160 (2007)
Q.F. Xia, W. Robinett, M.W. Cumbie, N. Banerjee, T.J. Cardinali, J.J. Yang, W. Wu, X.M. Li, W.M. Tong, D.B. Strukov, G.S. Snider, G. Medeiros-Ribeiro, R.S. Williams, Memristor-CMOS hybrid integrated circuits for reconfigurable logic. Nano Lett. 9(10), 3640–3645 (2009)
W. Wu, E. Kim, E. Ponizovskaya, Y. Liu, Z. Yu, N. Fang, Y.R. Shen, A.M. Bratkovsky, W. Tong, C. Sun, X. Zhang, S.Y. Wang, R.S. Williams, Optical metamaterials at near and mid-IR range fabricated by nanoimprint lithography. Appl. Phys. A Mater. Sci. Process. 87(2), 143–150 (2007)
D.J. Cho, W. Wu, E. Ponizovskaya, P. Chaturvedi, A.M. Bratkovsky, S.Y. Wang, X. Zhang, F. Wang, Y.R. Shen, Ultrafast modulation of optical metamaterials. Opt. Express 17(20), 17652–17657 (2009)
W. Wu, B. Cui, X.Y. Sun, W. Zhang, L. Zhuang, L.S. Kong, S.Y. Chou, Large area high density quantized magnetic disks fabricated using nanoimprint lithography. J. Vac. Sci. Technol. B 16(6), 3825–3829 (1998)
H. Oshima, H. Kikuchi, H. Nakao, K.-I. Itoh, T. Kamimura, T. Morikawa, K. Matsumoto, T. Umada, H. Tamura, K. Nishio, H. Masuda, Detecting dynamic signals of ideally ordered nanohole patterned disk media fabricated using nanoimprint lithography. Appl. Phys. Lett. 91(2), 22508 (2007)
W. Wu, M. Hu, F.S. Ou, Z.Y. Li, R.S. Williams, Cones fabricated by 3D nanoimprint lithography for highly sensitive surface enhanced Raman spectroscopy. Nanotechnology 21(25), 255502 (2010)
M. Hu, F.S. Ou, W. Wu, I. Naumov, X.M. Li, A.M. Bratkovsky, R.S. Williams, Z.Y. Li, Gold nanofingers for molecule trapping and detection. J. Am. Chem. Soc. 132(37), 12820–12822 (2010)
V.N. Truskett, M.P.C. Watts, Trends in imprint lithography for biological applications. Trends Biotechnol. 24(7), 312–317 (2006)
P.F. Murphy, K.J. Morton, Z. Fu, S.Y. Chou, Nanoimprint mold fabrication and replication by room-temperature conformal chemical vapor deposition. Appl. Phys. Lett. 90(20) (2007)
Y. Xia, G.M. Whitesides, Soft lithography. Angew. Chem. Int. Ed. 37(5), 550–575 (1998)
Y.N. Xia, G.M. Whitesides, Soft lithography. Annu. Rev. Mater. Sci. 28, 153–184 (1998)
T.W. Odom, J.C. Love, D.B. Wolfe, K.E. Paul, G.M. Whitesides, Improved pattern transfer in soft lithography using composite stamps. Langmuir 18(13), 5314–5320 (2002)
H. Schmid, B. Michel, Siloxane polymers for high-resolution, high-accuracy soft lithography. Macromolecules 33(8), 3042–3049 (2000)
H.X. Ge, W. Wu, Z.Y. Li, G.Y. Jung, D. Olynick, Y.F. Chen, J.A. Liddle, S.Y. Wang, R.S. Williams, Cross-linked polymer replica of a nanoimprint mold at 30 nm half-pitch. Nano Lett. 5(1), 179–182 (2005)
G.Y. Jung, Z.Y. Li, W. Wu, Y. Chen, D.L. Olynick, S.Y. Wang, W.M. Tong, R.S. Williams, Vapor-phase self-assembled monolayer for improved mold release in nanoimprint lithography. Langmuir 21(4), 1158–1161 (2005)
M.K. Chaudhury, G.M. Whitesides, Direct measurement of interfacial interactions between semispherical lenses and flat sheets of poly(dimethylsiloxane) and their chemical derivatives. Langmuir 7(5), 1013–1025 (1991)
P.J. Yoo, S.J. Choi, J.H. Kim, D. Suh, S.J. Baek, T.W. Kim, H.H. Lee, Unconventional patterning with a modulus-tunable mold: from imprinting to microcontact printing. Chem. Mater. 16(24), 5000–5005 (2004)
Y. Shen, L. Yao, Z. Li, J. Kou, Y. Cui, J. Bian, C. Yuan, H. Ge, W.-D. Li, W. Wu, Y. Chen, Double transfer UV-curing nanoimprint lithography. Nanotechnology 24(46), 465304 (2013)
R. Martinez-Duarte, G.T. Teixidor, P.P. Mukherjee, Q. Kang, M.J. Madou, in Perspectives of micro and nanofabrication of carbon for electrochemical and microfluidic applications, in microfluidics and microfabrication, ed. by S. Chakraborty (Springer, US, 2010), pp. 181–263
S. Kumagai, H. Tajima, M. Sasaki, Flow analysis of photoresist spray coating towards improving coverage on three-dimensional structures. Jpn. J. Appl. Phys. 50(10) (2011)
N.P. Pham, E. Boellaard, J.N. Burghartz, P.M. Sarro, Photoresist coating methods for the integration of novel 3-D RF microstructures. J. Microelectromech. Syst. 13(3), 491–499 (2004)
V.K. Singh, M. Sasaki, K. Hane, M. Esashi, Flow condition in resist spray coating and patterning performance for three-dimensional photolithography over deep structures. Jpn. J. Appl. Phys. Part 1 (Regular Papers Short Notes and Review Papers) 43(4B), 2387–2391 (2004)
V.K. Singh, M. Sasaki, J.H. Song, K. Hane, Technique for preparing defect-free spray coated resist film on three-dimensional micro-electromechanical systems. Jpn. J. Appl. Phys. Part 1 (Regular Papers Brief Communications and Review Papers) 44(4A), 2016–2020 (2005)
X. Liang, H. Tan, Z. Fu, S.Y. Chou, Air bubble formation and dissolution in dispensing nanoimprint lithography. Nanotechnology 18(2) (2007)
K. Usuki, S. Wakamatsu, T. Oomatsu, K. Kodama, K. Kodama, in Approaches to rapid resist spreading on dispensing based UV-NIL, Alternative Lithographic Technologies III, ed. by D.J.C. Herr (2011)
J. Linden, C. Thanner, B. Schaaf, S. Wolff, B. Laegel, E. Oesterschulze, Spray coating of PMMA for pattern transfer via electron beam lithography on surfaces with high topography. Microelectron. Eng. 88(8), 2030–2032 (2011)
M. Toepper, M. Wilke, J. Roeder, T. Fischer, C. Lopper, in IEEE, Coating Techniques for 3D-Packaging Applications, 2012 IEEE 62nd Electronic Components and Technology Conference, (2012) pp. 1673–1676
C.J. Brinker, G.C. Frye, A.J. Hurd, C.S. Ashley, Fundamentals of sol-gel dip coating. Thin Solid Films 201(1), 97–108 (1991)
P. Yimsiri, M.R. Mackley, Spin and dip coating of light-emitting polymer solutions: matching experiment with modelling. Chem. Eng. Sci. 61(11), 3496–3505 (2006)
Y.B. Kim, H.K. Kim, J.W. Hong, Epoxy-acrylic microgels in electrodeposition coating films. Surf. Coat. Technol. 153(2–3), 284–289 (2002)
R. Liu, F. An, S. Zhang, J. Luo, X. Liu, Photosensitive acrylate copolymer for electrodeposition photoresist. Polym. Sci. Ser. A 55(4), 225–232 (2013)
N.P. Pham, D.S. Tezcan, W. Ruythooren, P. De Moor, B. Majeed, K. Baert, B. Swinnen, Photoresist coating and patterning for through-silicon via technology. J. Micromech. Microeng. 18(12) (2008)
Y. Shen, L. Yao, Z. Li, J. Kou, Y. Cui, J. Bian, C. Yuan, H. Ge, W.-D. Li, W. Wu, Y. Chen, Double transfer UV-curing nanoimprint lithography. Nanotechnology 24(46), 465304 (2013)
Author information
Authors and Affiliations
Corresponding author
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 2015 Springer International Publishing Switzerland
About this chapter
Cite this chapter
Ge, H., Wu, W., Li, WD. (2015). Hybrid Nanoimprint-Soft Lithography for Highly Curved Surface with Sub-15 nm Resolution. In: Cusano, A., Consales, M., Crescitelli, A., Ricciardi, A. (eds) Lab-on-Fiber Technology. Springer Series in Surface Sciences, vol 56. Springer, Cham. https://doi.org/10.1007/978-3-319-06998-2_5
Download citation
DOI: https://doi.org/10.1007/978-3-319-06998-2_5
Published:
Publisher Name: Springer, Cham
Print ISBN: 978-3-319-06997-5
Online ISBN: 978-3-319-06998-2
eBook Packages: Physics and AstronomyPhysics and Astronomy (R0)