Abstract
In this work we have proposed an advanced AlGaN/GaN resonant tunneling diode (RTD) structure on silicon substrate which introduces modulation doped emitter collector regions and graded spacer layers. An analytical model has been presented to predict the variation of transmission coefficient (Tc) with different scattering phenomena. The physical interpretations of this structure define negligible scattering effects and polarization induced field. Simulated results show an improved current voltage (I–V) characteristics as well as high peak to valley current ratio (PVCR).
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Acknowledgment
The authors of IIT Kharagpur would like to acknowledge ENS Project, Department of Electronics and Information Technology (DeitY) Government of India for the project funding.
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Chowdhury, S., Santara, A., Mukhopadhyay, P., Biswas, D. (2014). Advanced AlGaN/GaN Resonant Tunneling Diode on Silicon Substrate for Negligible Scattering and Polarization effects. In: Jain, V., Verma, A. (eds) Physics of Semiconductor Devices. Environmental Science and Engineering(). Springer, Cham. https://doi.org/10.1007/978-3-319-03002-9_72
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DOI: https://doi.org/10.1007/978-3-319-03002-9_72
Publisher Name: Springer, Cham
Print ISBN: 978-3-319-03001-2
Online ISBN: 978-3-319-03002-9
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