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Studies on Nanostructured V2O5 Deposited by Reactive DC Magnetron Sputtering

  • P. Deepak Raj
  • Sudha Gupta
  • M. Sridharan
Conference paper
Part of the Environmental Science and Engineering book series (ESE)

Abstract

Nanostructured V2O5 thin films were deposited on to cleaned Si (100) substrates using reactive DC magnetron sputtering technique at various substrate temperatures (Ts). The grain sizes of the films were around 140–210 nm. The field emission-scanning electron micrographs showed nanosheet like structure grown perpendicular to substrate. The optical bandgap energy of the films increased with increase in Ts. The films deposited at 100 °C exhibited a temperature coefficient of resistance (TCR) value of −2.5 %/ °C.

Keywords

V2O5 Sputtering Nanosheets TCR 

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Notes

Acknowledgments

PDR and MS thank Authors thank Defense Research and Development Organisation, Govt. of India for the financial support and SASTRA university for providing the infrastructural facilities.

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Copyright information

© Springer International Publishing Switzerland 2014

Authors and Affiliations

  1. 1.Functional Nanomaterials and Devices Lab, Centre for Nanotechnology and Advanced Biomaterials and School of Electrical and Electronics EngineeringSASTRA UniversityThanjavurIndia
  2. 2.Solid State Physics LaboratoryNew DelhiIndia

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