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Fabrication of High Density Silicon Microprobe Array

  • Shankar Dutta
  • Isha Yadav
  • Praveen Kumar
  • Anand
  • Ramjay Pal
Conference paper
Part of the Environmental Science and Engineering book series (ESE)

Abstract

High density microprobe arrays have been widely used for several applications. In this work, we are presenting a simple one mask fabrication process of silicon based high density microprobe array (20 × 20) with an array pitch of 20 μm. The dimension of single microprobe structure is: 20 μm × 20 μm × 120 μm. Here, photoresist of 2.5 μm thickness is used as masking layer during the fabrication of microprobe array. The microstructure array is fabricated by using deep reactive ion etching (DRIE). Fabrication aspects of silicon based high density microprobe array are discussed.

Keywords

Microprobe array Deep reactive ion etching Photoresist masking 

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Copyright information

© Springer International Publishing Switzerland 2014

Authors and Affiliations

  • Shankar Dutta
    • 1
  • Isha Yadav
    • 1
  • Praveen Kumar
    • 1
  • Anand
    • 1
  • Ramjay Pal
    • 1
  1. 1.Solid State Physics LaboratoryDRDOTimarpurIndia

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