Functional Nanostructures Fabricated by Focused Electron/Ion Beam Induced Deposition pp 31-44 | Cite as
Experimental Techniques
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In this chapter we present the experimental techniques used in the development of this thesis, for the fabrication of samples and for subsequent characterization. The sample fabrication was carried out in three “Dual Beam” (SEM/FIB) systems with similar characteristics: Nova 200 NanoLab and Helios NanoLab 600 stationed in the Advanced Microscopy Laboratory, Institute of Nanoscience of Aragon (INA-LMA), University of Zaragoza, and the Nova 600 NanoLab installed at the Eindhoven University of Technology (TU/e). The characterization of the samples was performed in situ (SEM, EDS, electrical transport measurements) and ex situ (AFM, PPMS, HRTEM, STEM/EELS,…) in the Advanced Microscopy Laboratory, Institute of Nanoscience of Aragon (LMA-INA) and the Physical Measurements Service of the University of Zaragoza.
Nanolithography by “Dual Beam”
Description of a “Dual Beam”
Keywords
Electron Energy Loss Spectroscopy Spherical Aberration Precursor Material Physical Property Measurement System Lamella ThicknessReferences
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