Abstract
Self-assembled monolayers of sulfur-containing heterocycles and linear oligomers-containing thiophene groups are widely employed in organic electronic applications. Here, the surface dynamics of thiophene on Cu(111) are investigated by helium-3 spin-echo spectroscopy and molecular dynamics simulations. Thiophene adsorbs on top sites and forms a covalent S-Cu bond. Two competing activated processes are observed, manifest in a kink in the Arrhenius plot: jump diffusion between adjacent top sites over a barrier of 59–62 meV and rotation around the S-Cu anchor point over a barrier of 17 \(\pm \) 2 meV. In addition, flapping between different tilt angles is observed. MD simulations of the diffusive motion reveal an exceptionally high friction coefficient of 5 \(\pm \) 2 \(\mathrm{ps}^{-1}\).
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Notes
- 1.
At low \(\Delta {\varvec{K}}\) values the isfs are not fully resolved with the beam energy used but the resolution is sufficient to determine the curvature of the isfs.
- 2.
It should be noted that the momentum transfer dependence shows a somewhat different behaviour at large \(\Delta {\varvec{K}}\) when the data are analysed from a smaller time, \(t\), due to the mixing of different processes. However, no significant change was observed in the temperature and momentum transfer dependence at low \(\Delta {\varvec{K}}\).
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Lechner, B.A.J. (2014). The Atomic-Scale Motion of Thiophene on Cu(111). In: Studying Complex Surface Dynamical Systems Using Helium-3 Spin-Echo Spectroscopy. Springer Theses. Springer, Cham. https://doi.org/10.1007/978-3-319-01180-6_7
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