Abstract
Lithography is a constantly developing field, that is essential for many advanced technologies. Establishing the ability to pattern materials with high fidelity and resolution without compromising their properties is therefore important. The rapid pace of technological advancements triggers continual developments of cost effective lithographic schemes which eventually will enable the fabrication of a broad spectrum of structures in a controlled manner within extremely short periods of time.
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Oppenheimer, P.G. (2013). Rapid Patterning of Low-Viscosity Resists Using Electrohydrodynamic Lithography. In: Electrohydrodynamic Patterning of Functional Materials. Springer Theses. Springer, Heidelberg. https://doi.org/10.1007/978-3-319-00783-0_4
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DOI: https://doi.org/10.1007/978-3-319-00783-0_4
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