Abstract
Microtargetry for high power lasers (HPLs) offers considerable challenges and opportunities at the cutting edge of the application of microtechnology production techniques. In this chaptermicrotarget production issues are discussed particularly in the context of the mass production of such components which has become one of the major challenges in delivering targets for High Power Laser (HPL) systems and will become essential in the near future as lasers move to application based systems. The challenges of microtarget placement are also discussed.
Keywords
- Computer Numerical Control
- High Power Laser
- High Repetition Rate
- Computer Numerical Control Machine
- Preparatory Phase
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.
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Acknowledgements
The authors would like to thank a wide range of collaborators whose work has contributed significantly to this article. In particular all current and past staff on the Target Fabrication Laboratory at the Central Laser Facility, RAL, specifically Donna Wyatt, Sam Serra, and Ian East; all current and past staff of the Target Fabrication Laboratory at AWE, and Wigen Nazarov at the University of St Andrews.
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Tolley, M., Spindloe, C. (2013). Microtargetry for High Power Lasers. In: McKenna, P., Neely, D., Bingham, R., Jaroszynski, D. (eds) Laser-Plasma Interactions and Applications. Scottish Graduate Series. Springer, Heidelberg. https://doi.org/10.1007/978-3-319-00038-1_17
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DOI: https://doi.org/10.1007/978-3-319-00038-1_17
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