Abstract
We conduct a thorough investigation of the tunneling dynamics of oxide traps in a-SiO2, in particular of the E ′δ center, the E ′γ center, their hydrogenated counterparts, and the H atom. Based on these findings their behavior in the context of tunneling can be deduced. It is found that an E ′γ center can exchange electrons with the Si bulk. The E ′δ center shows two distinct behaviors induced by a spread in its tunneling levels. The H atom is not affected by the presence of an interface, whereas a H bridge may occur in every charge state.
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© 2007 Springer-Verlag Wien
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Gös, W., Grasser, T. (2007). First-Principles Investigation on Oxide Trapping. In: Grasser, T., Selberherr, S. (eds) Simulation of Semiconductor Processes and Devices 2007. Springer, Vienna. https://doi.org/10.1007/978-3-211-72861-1_38
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DOI: https://doi.org/10.1007/978-3-211-72861-1_38
Publisher Name: Springer, Vienna
Print ISBN: 978-3-211-72860-4
Online ISBN: 978-3-211-72861-1
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