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High-Charge XUV Vortex Beam: Generation and Hartmann Wavefront Sensor Characterization

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X-Ray Lasers 2018 (ICXRL 2018)

Abstract

In this paper, we present the characterization of high charge vortex structure of an OAM beam produced through high-harmonic generation in a rare gas using an XUV Hartmann wavefront sensor. We show that the phase-matched absorption limited high-harmonic generation is able to retain the high-charge vortex structure of the XUV beam even in a rather long (1 cm) generation medium. Additionally, our recent results on the influence of infrared driver wavefront quality on the characteristics of XUV vortex beam are presented.

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Acknowledgements

The vortex optics used in this report were developed with the support of the U.S. Army Research Office. The project LIDEX OPT2X-Université Paris-Saclay funded the Hartmann XUV sensor. The PhD thesis of F. Sanson is funded through a CIFRE contract with the Amplitude Technologies company. The authors thank the Centrale d’Elaboration et de Métrologie des Optiques XUV (CEMOX) installation at Institut d’Optique Graduate School (IOGS) Palaiseau for the multilayer optics.

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Correspondence to F. Sanson .

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Sanson, F. et al. (2020). High-Charge XUV Vortex Beam: Generation and Hartmann Wavefront Sensor Characterization. In: Kozlová, M., Nejdl, J. (eds) X-Ray Lasers 2018. ICXRL 2018. Springer Proceedings in Physics, vol 241. Springer, Cham. https://doi.org/10.1007/978-3-030-35453-4_12

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