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High-Efficient Low-Cost Photovoltaics pp 43–64Cite as

Silicon Nitride and Aluminum Oxide—Multifunctional Dielectric Layers Crucial for the Progress of Silicon Solar Cells

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Part of the book series: Springer Series in Optical Sciences ((SSOS,volume 140))

Abstract

The achievement of high efficiencies for crystalline silicon solar cells is highly dependent on the reduction of carrier recombination at both cell surfaces. As a new era in PV, this loss of charges can be minimized by simply depositing silicon nitride or aluminum oxide layers at low temperatures. Due to their fascinating properties, both dielectric films became key components of present and future monofacial and bifacial silicon solar cells. As a special highlight, by an innovative aluminum oxide-based rear side scheme, high efficiency industrial cells (PERC) could be developed which are generally regarded to become next-generation solar cells.

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Authors and Affiliations

  1. University of Hannover and ZAE Bayern, Josef-Heppner-Straße 26, 82049, Pullach, Germany

    R. Hezel

  2. Munich University of Applied Sciences, Josef-Heppner-Straße 26, 82049, Pullach, Germany

    K. Jaeger-Hezel

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  1. R. Hezel
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Editors and Affiliations

  1. Gate East, Garching, Germany

    Vesselinka Petrova-Koch

  2. University of Hannover, Pullach, Germany

    Rudolf Hezel

  3. Fraunhofer Institute for Solar Energy System, Freiburg, Baden-Württemberg, Germany

    Adolf Goetzberger

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Hezel, R., Jaeger-Hezel, K. (2020). Silicon Nitride and Aluminum Oxide—Multifunctional Dielectric Layers Crucial for the Progress of Silicon Solar Cells. In: Petrova-Koch, V., Hezel, R., Goetzberger, A. (eds) High-Efficient Low-Cost Photovoltaics. Springer Series in Optical Sciences, vol 140. Springer, Cham. https://doi.org/10.1007/978-3-030-22864-4_4

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