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Thermodynamics and Kinetics of Chemical Vapour Deposition

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Book cover Chemical Vapour Deposition

Part of the book series: Engineering Materials and Processes ((EMP))

Abstract

Thermodynamic studies of a CVD process are undertaken to provide a basic understanding of chemical reactions under equilibrium conditions. To ensure a high quality of a CVD coating it is essential to determine the feasibility of a particular CVD reaction first, then select the suitable precursors for the CVD processes. CVD phase diagrams are derived based on the minimisation of Gibbs free energy and are useful in predicting the equilibrium phases present in the chemical reaction system under given processing conditions determined by the deposition temperature, pressure and reactant concentration.

A CVD process is also a non-equilibrium process and typically consists of complex chemical reactions. The kinetics of a CVD system involves many steps which determine the rate of the deposition process. Among them, three important steps are: (1) homogeneous reactions taking place among the gases in a reaction chamber, (2) heterogeneous reactions occurring on the surface of a substrate and (3) mass transportation of the gaseous precursors. The overall deposition rate of the CVD process is limited by the slowest step in the three aforementioned steps. This chapter covers these topics and gives details on these processes.

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(2010). Thermodynamics and Kinetics of Chemical Vapour Deposition. In: Chemical Vapour Deposition. Engineering Materials and Processes. Springer, London. https://doi.org/10.1007/978-1-84882-894-0_4

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