Abstract
The chapter provides an overview of engineering process control (EPC). The need for EPC and earlier misconceptions about process adjustments are discussed. A brief overview of time series is provided to model process disturbances. Optimal feedback controllers considering the various costs involved such as off-target costs, adjustment costs and sampling costs are discussed. Further, optimal control strategies in the case of short production runs and adjustment errors are also discussed. This is followed by an overview of run-to-run control in the semiconductor industry. First the most widely used single-EWMA controllers are detailed and then their weakness and the need for double EWMA controllers are discussed. Double-EWMA is detailed and its transient and steady state performances are also discussed. Further, the need for variable EWMA and initial intercept iteratively adjusted (IIIA) controllers are pointed out and elaborated on. The chapter then addresses some criticism of EPC and responses to it. Finally the integration of SPC and EPC for greater benefits is discussed.
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Butte, V.K., Tang, L.C. (2008). Engineering Process Control: A Review. In: Misra, K.B. (eds) Handbook of Performability Engineering. Springer, London. https://doi.org/10.1007/978-1-84800-131-2_15
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DOI: https://doi.org/10.1007/978-1-84800-131-2_15
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