Abstract
This monograph reviews bilayer and alloy techniques with Ti, Al and others to form adhesion layers and diffusion barriers. The temperature range of thermal stability is covered. During Ti and Al transport to form the encapsulating layers, the Ag films develop <111> texture. Integration with low-K dielectrics such as paralene has been demonstrated. Encapsulated Ag films have superior resistance to electromigration degradation.
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(2008). Summary. In: Silver Metallization. Engineering Materials and Processes. Springer, London. https://doi.org/10.1007/978-1-84800-027-8_7
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DOI: https://doi.org/10.1007/978-1-84800-027-8_7
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