Abstract
In this study, the optical multilayer thin-film coatings, started from optical design, are successfully deposited on glass substrates. Thermal evaporation method is used to prepare optical multilayer thin-film coatings, such as band-pass filter, edge filter, anti-reflective coating, for key components of consumer electronics products. Electron beam gun evaporation with and without plasma-ion enhanced source during deposition are compared in our system. The coating products, deposited with plasma-ion enhanced source, have high packing density, high refractive index, good adhesion, in comparison to those of conventional thermal evaporation or electron beam gun evaporation without plasma-enhanced source in coating chamber. In addition, excellent environmental stability, impervious to humidity, good uniformity among the substrate, and low wavelength shift with temperature in coating layers, which are especially important for mass prodution, are sucessfully obtained in this study.
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References
Macleod H. A. 2001, Thin Film Optical Filters, 3rd ed., Institute of Physics Publishing. Bristol and Philadelphia.
Smith D., 1995, Thin Film Deposition, MaGraw-Hill, Inc.
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© 2007 Springer-Verlag London Limited
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Chen, G.L. et al. (2007). Plasma-Ion Enhanced Optical Multilayer Thin-Film Coating for Consumer Electronics Products. In: Hinduja, S., Fan, KC. (eds) Proceedings of the 35th International MATADOR Conference. Springer, London. https://doi.org/10.1007/978-1-84628-988-0_4
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DOI: https://doi.org/10.1007/978-1-84628-988-0_4
Publisher Name: Springer, London
Print ISBN: 978-1-84628-987-3
Online ISBN: 978-1-84628-988-0
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