Abstract
Since 1974, when Taniguchi coined the expression nanotechnology [1] as a description of manufacturing processes, a lot of different techniques for manufacturing on this small scale have been developed. Until that time, manufacturing processes on the micrometer scale used to be the limit. Conventional semiconductor-processing technologies are mostly limited by the achievable resolution in lithography. However, this resolution depends on the wavelength of light — or, in general, on electromagnetic waves. In order to process materials on the nanometer scale, it is either necessary to develop a new approach in materials structuring (often referred to as the bottom-up approach) or to extend the possibilities of common techniques, for example by using electromagnetic waves with considerably shorter wavelengths.
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10.8 References
Taniguchi, N. 1974, ‘On the basic concept of nanotechnology’, Proc. Intl. Conf. Prod. Eng. Tokyo, vol. 2, pp 18–32.
Dujardin, G., Mayne, A., Robert, O., Rose, F., Joachim, C. & Tang, H. 1998, ‘Vertical manipulation of individual atoms by a direct STM tip-surface contact on Ge(111)’, Phys. Rev. Lett., vol. 80, no. 14, pp. 3085–3088.
Utke, I., Bret, T., Laub, D., Buffat, P., Scandella, L. & Hoffmann, P. 2004, ‘Thermal effects during focused electron beam induced deposition of nanocomposite magneticcobalt-containing tips’, Microelectron. Eng., vol. 73–74, no. 1, pp. 553–558.
Hoffmann, P., Utke, I. & Cicoira, F. 2002, ‘Limits of 3D nanostructures fabricated by focused electron beam (FEB) induced deposition’, 10th International Symposium on Nanostructures: Physics and Technology, vol. 5023, pp. 4–10.
Silvis-Cividjian, N., Hagen, C. W., Leunissen, L. H. A. & Kruit, P. 2002, ‘The role of secondary electrons in electron-beam-induced-deposition spatial resolution’, Microelectronic Engineering, vol. 61–62, pp. 693–699.
Scheuer, V., Koops, H. & Tschudi, T. 1986, ‘Electron beam decomposition of carbonyls on silicon’, Microelectron. Eng., vol. 5, no. 1–4, pp. 423–430.
Stewart, R. L. 1934, ‘Insulating films formed under electron and ion bombardment’, Phys. Rev., vol. 45, no. 7, pp. 488–490.
Ennos, A. E. 1954, ‘The sources of electron-induced contamination in kinetic vacuum systems’, British Journal of Applied Physics, vol. 5, no. 1, pp. 27–31.
Christy, R. W. 1960, ‘Formation of thin polymer films by electron bombardment’, Journal of Applied Physics, vol. 31, no. 9, pp. 1680–1683.
Ling, J. 1966, ‘An approximate expression for the growth rate of surface contamination on electron microscope specimens’, British Journal of Applied Physics, vol. 17, no. 4, pp. 565–568.
Broers, A. N., Molzen, W. W., Cuomo, J. J. & Wittels, N. D. 1976, ‘Electron-beam fabrication of 80-A metal structures’, Applied Physics Letters, vol. 29, no. 9, pp. 596–598.
Koops, H. W. P., Weiel, R., Kern, D. P. & Baum, D. P. 1988, ‘High-resolution electron-beam induced deposition’, Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, vol. 6, no. 1, pp. 477–481.
Griesinger, U. A., Kaden, C., Lichtenstein, N., Hommel, J., Lehr, G., Bergmann, R., Menschig, A., Schweizer, H., Hillmer, H., Koops, H. W. P., Kretz, J. & Rudolph, M. 1993, ‘Investigations of artificial nanostructures and lithography techniques with a scanning probe microscope’, Proceedings of the 16th international symposium on electron, ion, and photon beams, vol. 11, pp. 2441–2445.
Koops, H. W. P., Kretz, J., Rudolph, M. & Weber, M. 1993, ‘Constructive three-dimensional lithography with electron-beam induced deposition for quantum effect devices’, Proceedings of the 16th international symposium on electron, ion, and photon beams, vol. 11, pp. 2386–2389.
Weber, M., Rudolph, M., Kretz, J. & Koops, H. W. P. 1995, ‘Electron-beam induced deposition for fabrication of vacuum field emitter devices’, 7th International Vacuum Microelectronics Conference, vol. 13, pp. 461–464.
Koops, H. W. P., Kretz, J. & Rudolph, M. 1994, ‘Characterization and application of materials grown by electron-beam-induced deposition’, Jpn. J. Appl. Phys., vol. 33, no. Part 1, 12B, pp. 7099–7107.
Kohlmann-von Platen, K. T., Buchmann, L.-M., Petzold, H.-C. & Brunger, W. H. 1992, ‘Electron-beam induced tungsten deposition: Growth rate enhancement and applications in microelectronics’, Proceedings of the 36th International Symposium on electron, iron, and photon beams, vol. 10, pp. 2690–2694.
Hübner, U., Plontke, R. & Blume, M. 2001, ‘On-line nanolithography using electron beam-induced deposition technique’, Microelectronic Engineering, vol. 57–58, pp. 953–958.
Utke, I., Hoffmann, P., Berger, R. & Scandella, L. 2002, ‘High-resolution magnetic Co supertips grown by a focused electron beam’, Applied Physics Letters, vol. 80, no. 25, pp. 4792–4794.
Liu, Z., Mitsuishi, K. & Furuya, K. 2004, ‘Three-dimensional nanofabrication by electron-beam-induced deposition using 200-keV electrons in scanning transmission electron microscope’, Applied Physics A: Materials Science & Processing, vol. 80, no. 7, pp. 1437–1441.
Utke, I., Luisier, A., Hoffmann, P., Laub, D. & Buffat, P. A. 2002, ‘Focused-electronbeam-induced deposition of freestanding three-dimensional nanostructures of pure coalesced copper crystals’, Applied Physics Letters, vol. 81, no. 17, pp. 3245–3247.
Mølhave, K., Madsen, D. N., Dohn, S. & Bøggild, P. 2004, ‘Constructing, connecting and soldering nanostructures by environmental electron beam deposition’, Nanotechnology, vol. 15, no. 8, pp. 1047–1053.
Wich, T. & Sievers, T. 2006, ‘Assembly inside a scanning electron microscope using electron beam induced deposition’, Proceedings of 2006 IEEE/RSJInternational Conference on Robots and Intelligent Systems.
Reimer, L. 1998, Scanning Electron Microscopy — Physics of Image Formation and Microanalysis, Vol. 45 of Springer Series in Optical Sciences, 2nd edn.
Balk, L. J., Blaschke, R., Bröcker, W., Demm, E., Engel, L., Göcke, R., Hantsche, H., Hauert, R., Krefting, E. R., Müller, T., Raith, H., Roth, M. & Woodtli, J., Praxis der Rasterelektronenmikroskopie und Mikrobereichsanalyse, Bartz, W. J.
Fuchs, E., Oppolenzer, H. & Rehme, H. 1990, Particle Beam Microanalysis (Fundamentals, Methods and Applications), VCH Weinheim.
Schiffmann, K. I. 1993, ‘Investigation of fabrication parameters for the electronbeam-induced deposition of contamination tips used in atomic force microscopy’, Nanotechnology, vol. 4, no. 3, pp. 163–169.
Utke, I., Cicoira, F. & Jaenchen, G. 2002, ‘Focused electron beam induced deposition of high resolution magnetic scanning probe tips’, Mat. Res. Soc. Symp. Proc., vol. 706.
Seiler, H. 1983, ‘Secondary electron emission in the scanning electron microscope’, Journal of Applied Physics, vol. 54, no. 11, pp. R1–R18.
Ono, S. & Kanaya, K. 1979, ‘The energy dependence of secondary emission based on the range-energy retardation power formula’, Journal of Physics D: Applied Physics, vol. 12, no. 4, pp. 619–632.
Reimer, L. 1999, ‘SEM/TEM Hypertext: per Mausklick (fast) alles über Elektronenmikroskopie’. CD-ROM.
Hasselbach, F. & Rieke, I. 1982, ‘Spatial distribution of secondaries released by backscattered electrons in silicon and gold for 20–70 keV primary energy’, 10th International Conference on Electron Microscopy, Hamburg, vol. 1, pp. 253–254.
Kanaya, K. & Kawakatsu, H. 1972, ‘Secondary electron emission due to primary and backscattered electrons’, Journal of Physics D: Applied Physics, vol. 5, no. 9, pp. 1727–1742.
Silvis-Cividjian, N. 2002, ‘Electron beam induced nanometer scale deposition’, Ph.D. thesis, Technische Universiteit Delft.
Wutz, M. 2004, Handbuch Vakuumtechnik, 8th edn, Vieweg Verlag.
Mølhave, K. 2006, ‘Tools for In situ Manipulation and characterisation of nanostructures’, Ph.D. thesis, MIC-Department of Micro and Nanotechnology, Technical University of Denmark.
James M. Lafferty (editor) 1998, Foundations of Vacuum Science and Technology, John Wiley and sons.
Utke, I., Friedli, V., Michler, J., Bret, T., Multone, X. & Hoffmann, P. 2006, ‘Density determination of focused-electron-beam-induced deposits with simple cantilever-based method’, Applied Physics Letters, vol. 88, no. 3, p. 031906.
Randolph, S. J., Fowlkes, J. D. & Rack, P. D. 2005, ‘Effects of heat generation during electron-beam-induced deposition of nanostructures’, Journal of Applied Physics, vol. 97, no. 12, p. 124312.
Becker, G. 1961, ‘Zur Theorie der Molekularstrahlerzeugung mit langen Kanälen’, Zeitschrift für Physik A, vol. 162, no. 3, pp. 290–312.
Giordmaine, J. A. & Wang, T. C. 1960, ‘Molecular beam formation by long parallel tubes’, Journal of Applied Physics, vol. 31, no. 3, pp. 463–471.
Jones, R. H., Olander, D. R. & Kruger, V. R. 1969, ‘Molecular-beam sources fabricated from multichannel arrays. I. Angular distributions and peaking factors’, Journal of Applied Physics, vol. 40, no. 11, pp. 4641–4649.
Boero, G., Utke, I., Bret, T., Quack, N., Todorova, M., Mouaziz, S., Kejik, P., Brugger, J., Popovic, R. S. & Hoffmann, P. 2005, ‘Submicrometer Hall devices fabricated by focused electron-beam-induced deposition’, Applied Physics Letters, vol. 86, no. 4, p. 042503.
Edinger, K., Becht, H., Bihr, J., Boegli, V., Budach, M., Hofmann, T., Koops, H. W. P., Kuschnerus, P., Oster, J., Spies, P. & Weyrauch, B. 2004, ‘Electron-beambased photomask repair’, The 48th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication, vol. 22, pp. 2902–2906.
Bret, T., Utke, I., Bachmann, A. & Hoffmann, P. 2003, ‘In situ control of the focused-electron-beam-induced deposition process’, Applied Physics Letters, vol. 83, no. 19, pp. 4005–4007.
Ding, W., Dikin, D. A., Chen, X., Piner, R. D., Ruoff, R. S., Zussman, E., Wang, X. & Li, X. 2005, ‘Mechanics of hydrogenated amorphous carbon deposits from electron-beam-induced deposition of a paraffin precursor’, Journal of Applied Physics, vol. 98, no. 1, p. 014905.
Utke, I., Friedli, V. & Fahlbusch, S. 2006, ‘Tensile strengths of metal-containing joints fabricated by focused electron beam induced deposition’, Advanced Engineering Materials, vol. 8, no. 3, pp. 137–140.
Wich, T., Kray, S. & Fatikow, S. 2006, ‘Microrobot based testing of nanostructures inside an SEM’, Proceedings of the 10th International Conference on New Actuators (Actuator).
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Wich, T. (2008). Nanostructuring and Nanobonding by EBiD. In: Fatikow, S. (eds) Automated Nanohandling by Microrobots. Springer Series in Advanced Manufacturing. Springer, London. https://doi.org/10.1007/978-1-84628-978-1_10
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DOI: https://doi.org/10.1007/978-1-84628-978-1_10
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