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Electrophoretic Deposition of Ceramic Coatings on Metal Surfaces

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Book cover Electrodeposition and Surface Finishing

Part of the book series: Modern Aspects of Electrochemistry ((MAOE,volume 57))

Abstract

Electrophoretic deposition (EPD) is a special colloidal processing technique that uses the electrophoresis mechanism for the movement of charged particles suspended in a solution under an electric field and to deposit them in an ordered manner on a substrate to develop thin and thick films, coatings, and free-standing bodies. EPD emerges as a method of choice due to formation of uniform thin or multilayer films of controlled thickness and morphology, even on substrates of complex shape [1–13]. The thickness and structure of deposited films can be easily controlled by changing the deposition parameters, i.e., applied voltage, deposition time, and particles concentration in suspension, while mechanical characteristics are good [14]. The interest in EPD is based not only on its high versatility to be used with different materials but also because EPD is a cost-effective technique usually requiring simple processing equipment and infrastructure [1]. Electrophoretic deposition is gaining increasing attention both in science and industry, due to novel applications in the processing of advanced ceramic materials.

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Acknowledgments

The author wishes to thank all coworkers who contributed with their work to obtain the experimental results presented in this chapter. Their names can be seen in our joint papers listed in the references.

This research was financed by the Ministry of Education, Science and Technological Development, Republic of Serbia, contract No. III 45019.

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Correspondence to Vesna B. Mišković-Stanković .

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Mišković-Stanković, V.B. (2014). Electrophoretic Deposition of Ceramic Coatings on Metal Surfaces. In: Djokić, S. (eds) Electrodeposition and Surface Finishing. Modern Aspects of Electrochemistry, vol 57. Springer, New York, NY. https://doi.org/10.1007/978-1-4939-0289-7_3

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