Abstract
Studies of reactively sputtered a-Ge:H show that the dangling bond density measured by optical absorption and electron spin resonance decreases exponentially with increasing hydrogen partial pressure. The magnitude of steady-state photoconductivity is inversely related to defect density in materials deposited or annealed above 350K, indicating that photoconduction is limited by defect mediated recombination. Materials prepared at lower temperatures are poor photoconductors despite low defect density. A residual mid-gap optical absorption of ~ 10 cm-1 is present which cannot be removed by H2 during growth.
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Persans, P.D., Ruppert, A.F., Roxlo, C.B. (1985). Defect Passivation and Photoconduction in Sputtered a-Ge:H. In: Adler, D., Fritzsche, H. (eds) Tetrahedrally-Bonded Amorphous Semiconductors. Institute for Amorphous Studies Series. Springer, Boston, MA. https://doi.org/10.1007/978-1-4899-5361-2_12
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DOI: https://doi.org/10.1007/978-1-4899-5361-2_12
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