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Alternatives to Oriented Crystallization on Amorphous Substrates

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Oriented Crystallization on Amorphous Substrates

Part of the book series: Microdevices ((MDPF))

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Abstract

Chapters 3, 4, and 5 described a variety of approaches, methods, and techniques that allow preparation of silicon films (and, in general, semiconductor films) on amorphous substrates by means of crystallization processes. In view of the broad interest in semiconductor films on insulating substrates, alternatives were and are being developed that have their own advantages and disadvantages with respect to these crystallization processes.

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  1. Institute of Crystallography, Academy of Sciences of the USSR, Moscow, USSR

    E. I. Givargizov

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Givargizov, E.I. (1991). Alternatives to Oriented Crystallization on Amorphous Substrates. In: Oriented Crystallization on Amorphous Substrates. Microdevices. Springer, Boston, MA. https://doi.org/10.1007/978-1-4899-2560-2_7

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