Abstract
In the past few years, the use of lasers to induce or enhance chemical reactions at gas-solid interfaces has experienced a rapid growth driven both by technological and scientific interest1,2. Laser photochemical deposition and laser direct writing of fine metal patterns from metalorganic precursors3,4 are low-temperature techniques which are fully compatible with current integrated circuit (IC) technology and can be used to repair5 and customize6 integrated circuits in situ without the need of a masking step. However very few publications7–10 have been devoted to the mechanisms of laser photochemical deposition including gas phase and adsorbed phase contributions, and particularly of photonucleation where the surface adsorbates can play the major role.
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Bourree, J.E., Flicstein, J. (1989). Photonucleation and Photodeposition of A1 on Si from Flowing. In: Cole-Hamilton, D.J., Williams, J.O. (eds) Mechanisms of Reactions of Organometallic Compounds with Surfaces. NATO ASI Series, vol 198. Springer, Boston, MA. https://doi.org/10.1007/978-1-4899-2522-0_5
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