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Heteroepitaxy of InSb by Metal Organic Magnetron Sputtering

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Part of the book series: NATO ASI Series ((NSSB,volume 198))

Abstract

Metalorganic magnetron sputtering (MOMS) is an emerging technology that is currently being developed for the epitaxial deposition of multi-component materials1. The various elemental or compound sources in the MOMS system are provided by a combination of high purity targets that are magnetron sputtered in an atmosphere of low pressure argon, and by metalorganic compounds introduced near the growth surface via a conventional gas manifold.

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© 1989 Springer Science+Business Media New York

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Webb, J.B., Rao, T.S., Halpin, C., Noad, J.P. (1989). Heteroepitaxy of InSb by Metal Organic Magnetron Sputtering. In: Cole-Hamilton, D.J., Williams, J.O. (eds) Mechanisms of Reactions of Organometallic Compounds with Surfaces. NATO ASI Series, vol 198. Springer, Boston, MA. https://doi.org/10.1007/978-1-4899-2522-0_31

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  • DOI: https://doi.org/10.1007/978-1-4899-2522-0_31

  • Publisher Name: Springer, Boston, MA

  • Print ISBN: 978-1-4899-2524-4

  • Online ISBN: 978-1-4899-2522-0

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