Abstract
Metalorganic magnetron sputtering (MOMS) is an emerging technology that is currently being developed for the epitaxial deposition of multi-component materials1. The various elemental or compound sources in the MOMS system are provided by a combination of high purity targets that are magnetron sputtered in an atmosphere of low pressure argon, and by metalorganic compounds introduced near the growth surface via a conventional gas manifold.
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References
J.B. Webb and C. Halpin, Appl. Phys.Lett. 47(1985)831.
M.G. Jacko and S.J.W. Price, Can.J.Chem.42(1964)1198.
H. Heinecke, A. Brauers, H. Luth and P. Balk, J.Cryst.Growth 77(1986)241.
G.B. Stringfellow, J.Cryst.Growth, 68(1984)111.
T.Sudersena Rao, C.Halpin, J.B.Webb, J.P.Noad and K.Rajan “Proc. of the 7th Intl.Conf.on Thin Films”, Delhi, Dec.l987.(in press).
J.B. Webb, C. Halpin and J.P. Noad, J.Appl.Phys. 60(1986)2949.
J.B. Webb. C. Halpin and J.P. Noad. J.Vac.Sci.Technol.A4(1986)379.
N. Putz, H. Heinecke, M. Heyen, P. Balk, M. Weyers and H. Luth. J.of Cryst. Growth, 74(1986)292.
E. Tokumitsu, Y. Kudou, M. Konagai and K. Takahashi.Jpn.J.of Appl.Phys. 24(1985)1189.
S. Horiguchl. K. Kimura. S. Takagishi K. Kamon. M. Mashita. M. Mikara and M. Ishii.Jpn.J.of Appl.Phys.26(1987)2002.
R.M. Lum, J.K. Klingert. D.W. Kisker. D.M. Tennant. M.D. Morris. D.L. Molm J.K. Kovalchick and L.A. Heimbrook.J.Electron.Mat.17(1988)101.
K. Kimura. S. Horiguchi. K. Kamon Mashita, M. Mihara and M. Ishii, Jap.J.Appl.Phys.26(1987)419.
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© 1989 Springer Science+Business Media New York
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Webb, J.B., Rao, T.S., Halpin, C., Noad, J.P. (1989). Heteroepitaxy of InSb by Metal Organic Magnetron Sputtering. In: Cole-Hamilton, D.J., Williams, J.O. (eds) Mechanisms of Reactions of Organometallic Compounds with Surfaces. NATO ASI Series, vol 198. Springer, Boston, MA. https://doi.org/10.1007/978-1-4899-2522-0_31
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DOI: https://doi.org/10.1007/978-1-4899-2522-0_31
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