Abstract
The group set out to discuss three topics:-
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(i)
What is presently known of surface and gas phase reactions involving Group V hydrides and Group III alkyls that is pertinent to low pressure growth.
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(ii)
What techniques could be used to provide new and relevant information and to what extent are’ static’ techniques applicable to growth studies.
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(iii)
What are the benefits of atomic layer epitaxy (ALE) in the low-pressure regime.
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© 1989 Springer Science+Business Media New York
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Joyce, B.A. (1989). Alternative Growth Techniques to Atmospheric Pressure MOCVD. In: Cole-Hamilton, D.J., Williams, J.O. (eds) Mechanisms of Reactions of Organometallic Compounds with Surfaces. NATO ASI Series, vol 198. Springer, Boston, MA. https://doi.org/10.1007/978-1-4899-2522-0_28
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DOI: https://doi.org/10.1007/978-1-4899-2522-0_28
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