Abstract
Quantum wells and superlattices offer exciting new possibilities for engineering the electronic band structure of semiconductor optoelectronic devices. Hydrostatic pressure also causes changes in the band structure which in many respects mimic the effects of quantum confinement and hence allows a systematic study to be made by varying the pressure on a single device. This avoids unwanted chemical changes that can occur when the band structure is varied in a growth sequence and thus allows parameters dependent only on the band structure to be clearly identified.
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References
AR Adams, M Asada, Y Suematsu and S Arai, The temperature dependence of the efficiency and threshold current in InGaAsP lasers related to intervalence band absorption, Jpn J Appl Phvs 19:L621 (1980).
N K Dutta and R J Nelson, The case for Auger recombination in InGaAsP, J Appl Phvs 53:74 (1982).
AR Adams, K C Heasman and E P O’Reilly, “Band structure engineering in Semiconductor Microstructures”, Plenum Press, 279-301 (1989).
W Ring and A R Adams, Pressure dependence of the threshold current and quantum efficiency of 1.55 μm MQW lasers, to be published.
W Ring, A R Adams and P J A Thijs, Pressure dependence of the threshold current and quantum efficiency of 1.55 μm strained-layer lasers, to be published.
AR Adams, Bandstructure engineering for low-threshold high efficiency semiconductor lasers, Electron Lett 22:249 (1986).
E P O’Reilly, Valence band engineering in strained-layr structures, Semicond Sei Technol 4:121 (1989).
A Ghiti, E P O’Reilly and A R Adams, Improved dynamics and linewidth enhancement factor in strained-layer lasers, Electron Lett 25:821 (1989).
P J A Thijs, L F Tiemeijer, P I Kuindersma, J J M Binsma and T Van Dongen, High performance 1.5 jim wavelength InGaAs/InGaAsP strained quantum well lasers and amplifiers, IEEE J Quantum Electronics, June (1991).
I K Czajkowski, J Allam, M Silver, A R Adams, M A Gell, Impact ionisation thresholds in silicon and germanium under hydrostatic pressure and strain, IEE Proc Pt J, 137:79 (1990).
J Allam, IK Czajkowski, A R Adams, M Silver, Pressure dependence of ionisation thresholds in Si, to be published.
J Allam, A R Adams, M A Pate, J S Roberts, Evidence for impact ionisation via X and F valleys in GaAs from hydrostatic pressure studies of avalanche breakdown, Proc GaAs and Related Compounds, 375 Jersey (1990).
B K Ridley, Lucky drift mechanism for impact ionisation in semiconductors, J Phvs. C: Solid State Physics 16:3373 (1983).
C L Anderson, C R Crowell, Threshold energies for electron-hole pair production by impact ionization in semiconductors, Phvs Rev B 5:2267 (1972).
R People, Physics and applications of GeSi/Si strained layer heterostructures, IEEE J Quantum Electron QE-22:1696 (1986).
I K Czajkowski, J Allam, A R Adams, Impact ionisation threshold in relaxed and strained Ge/Si alloys, to be published.
R Chin, N Holonyak Jnr, G E Stillman, J Y Tang, K Hess, Impact ionisation in multilayered heterojunction structures, Electron Lett 16:467 (1980).
K Brennan, Theory of electron and hole impact ionisation in quantum well and staircase superlattice avalanche photodiode structures, IEE Trans Electron Dev ED-32:2197 (1985).
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© 1991 Springer Science+Business Media New York
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Adams, A.R. (1991). Hydrostatic Pressure Investigations of Quantum-Well Optoelectronic Devices. In: Hochheimer, H.D., Etters, R.D. (eds) Frontiers of High-Pressure Research. NATO ASI Series, vol 286. Springer, Boston, MA. https://doi.org/10.1007/978-1-4899-2480-3_25
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DOI: https://doi.org/10.1007/978-1-4899-2480-3_25
Publisher Name: Springer, Boston, MA
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