Abstract
The design, processing and use of a serpentine-comb electrical defect monitor that does not require the photoresist to be stripped prior to testing is described. By use of a dual pad structure, the serpentine-comb pattern can be tested for opens and shorts while the resist remains on the pattern and on the defects. In this way, defects, (especially particulate induced ones) can be ascribed to either before or after photoresist application and in some instances to before or after resist patterning. The use of an electrical defect monitor of this type makes it possible to collect lithography related defect data from a sample area much larger than would be possible with conventional optical inspection methods.
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© 1991 Springer Science+Business Media New York
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Teutsch, C.W., Miller, B., Fournier, C. (1991). Isolation and Characterization of Particle Induced Defects from the Lithography Process Using an Electrical Defect Monitor. In: Mittal, K.L. (eds) Particles on Surfaces 3. Springer, Boston, MA. https://doi.org/10.1007/978-1-4899-2367-7_14
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DOI: https://doi.org/10.1007/978-1-4899-2367-7_14
Publisher Name: Springer, Boston, MA
Print ISBN: 978-1-4899-2369-1
Online ISBN: 978-1-4899-2367-7
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